Remote Plasma Ignition for Low-Power Trimming

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Solution Overview

Problem

Existing plasma ignition processes for trimming core materials in electronic device manufacturing are often unstable and can cause damage to the core material due to high power requirements, leading to deviations in pattern formation and non-uniformity.

Innovation Solution

A method involving a remote plasma unit that forms first and second activated species within a reaction chamber, where the first species assists in igniting the plasma at a lower power, using an inert gas like argon and an oxygen-containing gas like O2, CO2, or N2O, to trim features on a substrate while minimizing damage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If high power is used to ignite the plasma, then plasma ignition is achieved, but damage to the core material occurs

Engineering Contradiction:
Improveplasma ignition powerVSAvoiddamage to core material
Core Design Contradiction:
PowerVSObject-affected harmful factors

Solution Approach 1:

A remote plasma source is activated before the main plasma ignition to pre-condition the gas environment and enable lower-power ignition of the main plasma, thereby avoiding damage to the core material while achieving reliable plasma ignition

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The remote plasma acts as an intermediary that mediates between the power supply and the main plasma ignition process, creating favorable conditions for low-power ignition and reducing the harmful effects of high-power direct ignition on the core material

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If typical plasma ignition processes are used, then plasma is ignited, but the process is unstable and non-versatile

Engineering Contradiction:
Improveplasma ignition stabilityVSAvoidplasma ignition versatility
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The remote plasma source provides a universal ignition mechanism that can reliably ignite plasma across multiple different conditions and gas types, making the plasma ignition process both stable and versatile for various trimming conditions

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The system monitors plasma ignition conditions and adjusts the remote plasma power and timing to maintain stable ignition across varying process conditions, ensuring both reliability and adaptability to different trimming requirements

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach stabilizes plasma ignition, reduces feature damage, and improves uniformity in the trimming process, enhancing the precision and reliability of pattern formation in electronic device manufacturing.

Implementation Method 1

a remote plasma unit, forming first activated species; providing the first activated species to the reaction chamber for a first time interval; forming second activated species within the reaction chamber

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 2

The first time interval and the second time interval can overlap, such that the first activated species assists in igniting a plasma used to form the second activated species

Methodology Applied
Scientific EffectPhotoionisation: Photoionisation

Data Source

PatentUS11615970B2Radical assist ignition plasma system and method
Publication Date: 2023.03.28 ASM IP HLDG BV
  • US11615970B2 patent drawing
  • US11615970B2 patent drawing
  • US11615970B2 patent drawing

AI summary

Plasma-assisted methods and apparatus are disclosed. The methods and apparatus can be used to provide activated species formed in a remote plasma unit to a reaction chamber to assist ignition of a plasma within a reaction chamber coupled to the remote plasma unit.