Remote-Plasma Mask Repair With Local Reactive Species Delivery

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Solution Overview

Problem

Existing methods for processing objects using particle-induced chemical reactions are limited by the need for specific chemicals with optimal characteristics for controlled material removal, which often require stable storage and result in inefficient global application, leading to high maintenance and limited control over the reaction.

Innovation Solution

An apparatus that generates a reactive component from a precursor gas using an activator and guides it locally onto the object, combined with a particle beam, enabling precise and efficient particle-induced reactions on specific areas.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a specific precursor gas is used for optimal particle-induced reaction, then the material removal control is improved, but the storage stability requirement increases and global application efficiency decreases

Engineering Contradiction:
Improvematerial removal controlVSAvoidprocessing efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent divides the processing area into local zones, applying the particle beam and precursor gas only to specific regions requiring material removal rather than globally. This segmentation enables precise control of material removal in targeted areas while avoiding unnecessary exposure elsewhere, thus improving manufacturing precision without sacrificing overall processing efficiency

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements local application of the precursor gas and particle beam to specific regions of the object, creating different processing conditions in different areas. This local quality approach allows optimal material removal control in regions where it is needed while maintaining high productivity by avoiding global application to the entire object

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If a specific precursor gas is used for optimal particle-induced reaction, then the material removal control is improved, but the storage stability requirement increases

Engineering Contradiction:
Improvematerial removal controlVSAvoidprecursor gas storage stability
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent generates the reactive component from the precursor gas immediately before application through in-situ activation by the particle beam. This preliminary action eliminates the need for long-term storage of unstable reactive gases, as they are produced on-demand right at the processing location, thus improving material removal control while avoiding storage stability issues

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses a stable precursor gas as an intermediary substance that can be stored safely, which is then converted into the reactive component needed for material removal. This intermediary approach allows the system to benefit from the optimal chemical properties of reactive species without requiring direct storage of those unstable substances

Inventive Principle:
Principle #24Intermediary (Mediator)

3Area of stationary object

If particle beam is applied globally to activate precursor gas, then the reaction coverage is improved, but the processing control and efficiency deteriorate

Engineering Contradiction:
Improvereaction coverageVSAvoidprocessing control
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent segments the particle beam application to specific local regions rather than global coverage. The beam is directed only at areas requiring material removal, enabling precise processing control while maintaining adequate reaction coverage in the targeted zones. This segmentation resolves the contradiction by making coverage area sufficient for the actual processing needs without sacrificing control

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies different conditions (particle beam and precursor gas) to different local regions of the object based on processing requirements. This local quality approach ensures that reaction coverage is optimized in regions where material removal is needed while maintaining manufacturing precision through localized control, avoiding the drawbacks of uniform global application

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables effective, controlled particle-induced reactions with high local concentration of reactive components, reducing the need for stable storage and minimizing global exposure, thus enhancing processing efficiency and control.

Implementation Method 1

activating a precursor gas to generate a component from the precursor gas... inducing a chemical and/or physical reaction of the precursor gas

Methodology Applied
Scientific EffectChemical reaction: Chemical Bonding

Implementation Method 2

exposing the object to a chemical (e.g., a precursor gas) and additionally exposing the object to particles (e.g., electrons, photons, ions or a combination thereof)... the particles may induce a reaction in combination with the chemical such that a material of the object is removed

Methodology Applied
Scientific EffectParticle-induced chemical reaction: Chemical Bonding

Data Source

PatentUS20260050208A1Remote-plasma electron-induced mask repair
Publication Date: 2026.02.19 CARL ZEISS SMT GMBH
  • US20260050208A1 patent drawing
  • US20260050208A1 patent drawing
  • US20260050208A1 patent drawing

AI summary

The present invention relates to an apparatus for processing an object (O) comprising: an activator (A) for activating a precursor gas (P) to generate a component (C) from the precursor gas; a guide (G) for providing the component locally on the object; a beam unit (BU) for providing a particle (B) beam on the object. Further aspects relate to an according method and computer program.