Remote Plasma Resonator Structure for Compact Low-Damage Processing
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Solution Overview
Problem
Existing remote plasma devices are structurally large and costly due to the need for low-frequency RF power, making them difficult to scale down and assemble into predetermined spaces, and they often suffer from dielectric damage when using high-frequency microwaves.
Innovation Solution
A compact remote plasma device using high-frequency microwaves, specifically 860 MHz, with a metal housing, dielectric resonator, and a slot antenna to efficiently generate plasma in a gas line within the device, reducing size and manufacturing costs while preventing dielectric damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If low-frequency RF power is used in conventional remote plasma devices, then plasma can be generated, but the device becomes structurally large and costly
Solution Approach 1:
The patent changes the frequency parameter from conventional low-frequency RF to high-frequency microwave (860 MHz), which fundamentally alters the plasma generation mechanism and allows for significant device size reduction while maintaining plasma generation capability
Solution Approach 2:
The patent replaces the conventional inductively coupled plasma generation system with a dielectric resonator-based microwave system, substituting the mechanical coil structure with a resonant dielectric cavity that achieves plasma generation more efficiently in a compact form
2Volume of stationary object
If high-frequency microwaves are used to reduce device size, then device compactness is improved, but dielectric damage occurs due to excessive ion impact
Solution Approach 1:
The patent introduces a specifically designed dielectric resonator material that acts as an intermediary between the microwave field and the plasma, selecting materials with high dielectric strength and appropriate loss tangent to withstand ion impact while maintaining resonant coupling efficiency
Solution Approach 2:
The patent employs dynamic control of microwave power input and resonator coupling conditions to regulate ion flux and energy, preventing excessive ion impact that would damage the dielectric while maintaining effective plasma generation
3Productivity
If conventional remote plasma devices are used, then plasma processing can be performed, but manufacturing costs are high
Solution Approach 1:
The patent employs a dielectric resonator that can be manufactured using cost-effective ceramic or polymer materials, replacing expensive metallic coil assemblies and RF components, thereby reducing manufacturing costs while maintaining plasma processing functionality
Solution Approach 2:
The dielectric resonator structure serves multiple functions simultaneously: it acts as the microwave cavity, the coupling element to the plasma, and the protective barrier against ion damage, eliminating the need for separate components and reducing overall system cost
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables a scalable, cost-effective remote plasma device that can be easily integrated into plasma processing apparatuses, producing high-quality plasma without excessive ion impact, allowing for low-temperature substrate processing and high-quality film formation without ion damage.
Implementation Method 1
an electromagnetic wave supply part disposed at the housing, and configured to supply electromagnetic waves into the housing and produce plasma in the gas line
Implementation Method 2
a dielectric disposed to fill the housing... the dielectric has a structure that resonates with the electromagnetic waves at a frequency supplied by the electromagnetic wave supply part
Data Source
AI summary
There is a remote plasma device comprising: a housing made of a metal; a dielectric disposed to fill the housing; a gas supply port disposed at the housing, and configured to supply a gas into the housing; a gas exhaust port disposed at the housing, and configured to discharge the gas from the housing; a gas line that is formed in the dielectric and connects the gas supply port and the gas discharge port; and an electromagnetic wave supply part disposed at the housing, and configured to supply electromagnetic waves into the housing and produce plasma in the gas line.