Remote Plasma Showerhead Structure for Ion Filtering and Uniform ALD
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Solution Overview
Problem
Substrate processing systems using remote plasma face challenges in achieving uniform film deposition due to ion damage from plasma, where existing technologies fail to effectively filter ions while allowing beneficial radicals to pass through, leading to non-uniform film properties.
Innovation Solution
A showerhead design with optimized radical and precursor holes, arranged in specific patterns and densities, filters ions from remote plasma while allowing radicals to pass, ensuring uniform film deposition by separating the delivery of radicals and precursors, and maintaining a stable thermal and gas flow environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If remote plasma is introduced into the processing chamber for film deposition, then deposition rate is improved, but ion damage occurs causing non-uniform film properties
Solution Approach 1:
The showerhead is divided into multiple components (first component with radical holes, second component with precursor holes, third component) that are diffusion bonded together. This segmentation allows separate delivery paths for radicals and precursors, enabling radicals to reach the substrate while blocking ions, thus resolving the contradiction between maintaining high deposition rate and preventing ion damage.
Solution Approach 2:
The invention extracts and separates the harmful ions from the beneficial radicals by using a specialized showerhead structure with diffusion-bonded components. The first component with radical holes allows radicals to pass through while the structure blocks ions, effectively taking out the harmful factor (ions) while retaining the useful factor (radicals) for film deposition.
2Manufacturing precision
If ions are filtered from plasma to prevent damage, then film uniformity is improved, but radicals may also be blocked reducing deposition efficiency
Solution Approach 1:
The showerhead structure acts as an intermediary between the plasma source and substrate. The diffusion-bonded components with specifically designed hole patterns serve as a mediator that selectively transmits radicals while blocking ions, achieving both film uniformity and deposition efficiency without direct contact between plasma and substrate.
Solution Approach 2:
Different components of the showerhead have different local properties: the first component has radical holes optimized for radical transmission, the second component has precursor holes for precursor gas delivery, and the diffusion bond interfaces are designed with specific porosity and structure. This local quality differentiation enables selective particle transmission while maintaining overall system performance.
3Device complexity
If precursors and radicals are delivered through the same path, then device complexity is reduced, but film deposition uniformity deteriorates
Solution Approach 1:
The showerhead is segmented into multiple functional components (first component with radical holes, second component with precursor holes, third component) connected by diffusion bonds. This segmentation creates separate delivery paths for radicals and precursors, achieving uniform film deposition while maintaining a relatively simple integrated structure that appears as a single showerhead assembly.
Solution Approach 2:
Multiple functional components are merged together through diffusion bonding to form an integrated showerhead assembly. The first component, second component, and third component are combined into a single structural unit that delivers radicals and precursors through separate but coordinated paths, achieving both functional separation and structural integration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves near-zero radial and azimuthal non-uniformity in film deposition, enhancing the quality and consistency of films deposited on substrates, and allows for precise control of micro-volume and thermal conditions during ALD processes.
Implementation Method 1
A showerhead design with optimized radical and precursor holes, arranged in specific patterns and densities, filters ions from remote plasma while allowing radicals to pass
Implementation Method 2
ensuring uniform film deposition by separating the delivery of radicals and precursors
Implementation Method 3
ensuring uniform film deposition by separating the delivery of radicals and precursors
Implementation Method 4
maintaining a stable thermal and gas flow environment
Implementation Method 5
maintaining a stable thermal and gas flow environment
Data Source
AI summary
A showerhead comprises first, second, and third components. The first component includes a disc-shaped portion and a cylindrical portion extending perpendicularly from the disc-shaped portion. The disc-shaped portion includes first and second sets of holes having first and second diameters, respectively, that extend from a center of the disc-shaped portion to an inner diameter of the cylindrical portion. The second component is disc-shaped and is attached to the disc-shaped portion of the first component, defines a plenum that is in fluid communication with the second set of holes, and includes a pair of arc-shaped grooves along a periphery and on opposite ends of the top surface and a plurality of grooves extending between the pair of arc-shaped grooves. The third component is disc-shaped, is attached to the second component, and includes a gas inlet connected to the plenum, and fluid inlet and outlet connected to the arc-shaped grooves.