Remote Precursor Delivery with Buffer Volumes for Pressure Stability
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Solution Overview
Problem
Existing semiconductor processing systems face challenges in delivering large capacity vaporized precursors to remotely located reaction chambers due to significant pressure drops and flow losses over long distances, which affect delivery amount and exposure time.
Innovation Solution
A precursor delivery system with a remote precursor source vessel, first and second buffer volumes, and a closed-loop control system using pressure transducers and controllers to maintain consistent precursor delivery, employing carrier gases and adjustable valves to manage pressure and flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the precursor source vessel is located remotely from the reaction chamber, then the system footprint is reduced and operational flexibility is improved, but pressure drops and flow losses increase over long distances
Solution Approach 1:
A buffer volume is introduced as an intermediary between the remote precursor source vessel and the reaction chamber. This buffer acts as a reservoir that accumulates vaporized precursor, compensating for pressure drops and flow losses during long-distance transport through the precursor delivery line
Solution Approach 2:
The buffer volume pre-accumulates vaporized precursor before it reaches the reaction chamber. By storing precursor vapor in advance in the buffer, the system ensures continuous supply to multiple reaction chambers without being constrained by the remote location of the source vessel
2Ease of operation
If the precursor source vessel is located remotely, then ease of operation and maintenance are improved, but pressure control precision deteriorates due to long delivery distances
Solution Approach 1:
A pressure transducer is installed in the buffer volume to continuously monitor precursor pressure. This feedback signal is sent to a controller that adjusts the carrier gas flow rate through the precursor delivery line, automatically compensating for pressure drops and maintaining consistent precursor delivery despite the remote source location
Solution Approach 2:
The buffer volume serves as a pressure stabilization intermediary, decoupling the pressure fluctuations in the long delivery line from the reaction chamber. This isolation maintains precise pressure control at the reaction chamber inlet even when the source is remotely located
3Adaptability or versatility
If long delivery lines are used to connect remote source to reaction chambers, then system versatility is improved, but flow losses and exposure time increase
Solution Approach 1:
The buffer volume ensures continuous supply of vaporized precursor to the reaction chambers by maintaining a reservoir of precursor vapor. This continuous action in the buffer compensates for the time delays and flow losses inherent in long-distance delivery through extended precursor lines
Solution Approach 2:
The buffer acts as a temporal intermediary, storing precursor vapor and releasing it continuously to reaction chambers. This eliminates the direct dependency between source location and reaction chamber operation, allowing versatile system configuration without sacrificing delivery efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures efficient and consistent delivery of vaporized precursors to multiple reaction chambers by minimizing pressure drops and maintaining optimal flow rates, reducing system footprint and enabling seamless operation with minimal maintenance.
Implementation Method 1
These solid or liquid source substances may be heated to sublimation or evaporation to produce a vaporized precursor for a reaction process
Implementation Method 2
a large capacity vaporized precursor delivery system which utilizes a carrier gas to feed the vaporized precursor to a remotely located process zone
Data Source
AI summary
A semiconductor processing system for delivering large capacity vaporized precursor from solid or liquid precursor source is disclosed. The system utilizes a carrier gas to feed the vaporized precursor to a remotely located process zone where multiple process modules are disposed. The system comprises a first and second buffer volumes configured to reduce pressure drop and increase delivery rates. A method for delivering a large capacity vaporized precursor to the remotely located process zone are also disclosed.