Photosensitive Composition Removing Solution Residue Control
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Solution Overview
Problem
Conventional removing solutions for photosensitive composition residues on substrates and equipment are inadequate, leading to increased defect ratios and purity degradation in color filter manufacturing, as they often require large quantities and leave behind residues or vaporization residues.
Innovation Solution
A removing solution comprising alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters, and alicyclic ketones, combined with linear amides, cyclic amides, sulfur-containing compounds, and aromatic hydrocarbons, effectively removes pigment-containing photosensitive composition films from substrates and equipment surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional removing solutions (glycol ethers or their esters) are used for removal of photosensitive composition residues, then the removal process can be performed, but the resist-removing property is inadequate and large amounts of solution must be used resulting in production of removal residue
Solution Approach 1:
The patent changes the chemical composition parameters of the removing solution by specifying precise ratios of glycol ether (70-95 mass%), glycol ester (5-20 mass%), and water (0-30 mass%). This parameter optimization achieves effective removal of photosensitive composition residues while minimizing removal residue production, directly resolving the contradiction between removal effectiveness and residue generation.
Solution Approach 2:
The patent creates a composite removing solution by combining glycol ether, glycol ester, and water in specific proportions. This composite formulation synergistically enhances the removal property while controlling residue production, addressing both the effectiveness and residue issues simultaneously.
2Productivity
If large amounts of conventional removing solution are used to improve removal effectiveness, then more photosensitive composition can be removed, but production of removal residue increases
Solution Approach 1:
The patent optimizes the concentration parameters of the removing solution components to achieve high removal efficiency with minimal solution volume. The specified ranges (glycol ether: 70-95 mass%, glycol ester: 5-20 mass%, water: 0-30 mass%) enable effective removal while minimizing the total amount of solution needed and consequently the removal residue produced.
3Reliability
If pigment-containing photosensitive composition is removed using conventional methods, then the photosensitive composition can be removed, but residue of pigment components remains on substrate or apparatus surfaces causing foreign inclusions and defect ratio increase
Solution Approach 1:
The patent modifies the chemical parameters of the removing solution by incorporating specific glycol esters (ethyl 3-ethoxypropionate, methyl 3-methoxypropionate) in controlled amounts (5-20 mass%). These compositional changes enhance the solution's ability to dissolve and remove pigment components completely, preventing residue formation on surfaces and maintaining manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly improves the cleaning and removal of photosensitive composition residues, preventing pigment aggregation and precipitation, and is suitable for various color filter manufacturing processes, including liquid crystal devices and organic EL devices.
Implementation Method 1
conventional removing solutions for photosensitive composition residues on substrates and equipment are inadequate... A removing solution comprising alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters, and alicyclic ketones, combined with linear amides, cyclic amides, sulfur-containing compounds, and aromatic hydrocarbons, effectively removes pigment-containing photosensitive composition films
Data Source
AI summary
A removing solution for photosensitive composition for removal of colored pigment-containing photosensitive compositions, comprising at least one solvent selected from the group consisting of alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, at least one solvent selected from the group consisting of linear amides, cyclic amides, sulfur-containing compounds and cyclic esters, and if desired an aromatic hydrocarbon having 9 or more carbon atoms. The removing solution for photosensitive composition exhibits excellent photosensitive composition removing performance.