Repeller Supporting Structure for Ion Generator Insulation
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Solution Overview
Problem
In semiconductor manufacturing, the degradation of insulation properties in ion implanters due to metal deposition on repeller components leads to reduced ionization efficiency and shortened ion source life, necessitating frequent replacements and decreased productivity.
Innovation Solution
A supporting structure for the repeller with a repeller extension portion and insulation member, forming a gap between the repeller and the arc chamber's inner wall, and a cover member creating a small chamber outside the arc chamber to maintain insulation and prevent conductive film formation, using high melting point materials for durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the repeller is installed via an insulation member provided within the arc chamber, then the repeller can repel electrons and improve ionization efficiency, but metal deposition on the insulation member degrades its insulation properties and shortens ion source life
Solution Approach 1:
The patent extracts the insulation member from the arc chamber environment by providing a through-hole in the arc chamber wall and extending the repeller base outside the arc chamber. This removes the insulation member from the harmful plasma and metal deposition environment, preventing degradation while maintaining its insulating function within the arc chamber.
Solution Approach 2:
The patent introduces a seal member as an intermediary component between the repeller base and the arc chamber wall. This seal member prevents direct contact between the insulation member and the arc chamber environment, blocking the pathway for metal deposition while allowing the repeller to function effectively.
2Reliability
If the repeller is electrically insulated from the arc chamber, then electron repulsion function is improved, but frequent replacement is needed when insulation degrades
Solution Approach 1:
The insulation member is extracted from the arc chamber environment and positioned outside, preventing exposure to plasma and metal deposition. This maintains consistent insulation properties and electron repulsion function over extended periods, reducing replacement frequency and maintaining high productivity.
Solution Approach 2:
The patent pre-configures the repeller structure with external positioning and sealing mechanisms before operation begins. This preliminary arrangement prevents insulation degradation from occurring in the first place, rather than addressing it after degradation happens, thereby maintaining continuous high productivity.
3Reliability
If source gas molecules are introduced into the arc chamber for ionization, then ion generation is achieved, but halogen radicals form chemical bonds with metal materials and deposit conductive films
Solution Approach 1:
The insulation member is extracted from the arc chamber environment where halogen radicals and metal deposition occur. By positioning it outside the arc chamber, the insulation member is removed from the harmful chemical environment that causes conductive film formation, while still performing its insulating function.
Solution Approach 2:
The seal member acts as an intermediary barrier that prevents halogen radicals and ionized substances from reaching the insulation member. This blocking function stops the chemical bonding and deposit formation process while allowing the ionization process to continue normally within the arc chamber.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces insulation degradation, extends the life of ion source components, and maintains ion generation efficiency by preventing conductive film formation on insulation members, thus enhancing productivity.
Implementation Method 1
an insulation member that electrically insulates the arc chamber and the repeller from each other
Implementation Method 2
a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber
Implementation Method 3
A DC-discharge type ion source heats a filament by a current to generate thermal electrons, which then heat a cathode. Thereafter, thermal electrons generated by the heated cathode are accelerated by a DC voltage within an arc chamber and collided with source gas molecules therein, so that atoms included in the source gas molecules are ionized
Implementation Method 4
thermal electrons generated by the heated cathode are accelerated by a DC voltage within an arc chamber and collided with source gas molecules therein, so that atoms included in the source gas molecules are ionized
Implementation Method 5
The source gas molecules of a halide generate halogen radicals in an ionization step, and the halogen radicals act on a component constituting the ion source, such as a metal material for an inner wall of the arc chamber, to form a chemical bond
Implementation Method 6
a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole
Data Source
AI summary
An ion generator includes: an arc chamber; a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole. The supporting structure includes a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.