Replica Mold Step Structure for Liquid Film Control
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Solution Overview
Problem
Replica molds used in imprint processes are prone to damage due to foreign substances, leading to increased manufacturing costs, and increasing the thickness of the replica pattern portion compromises the controllability of the uncured curable composition, making it difficult to meet specifications.
Innovation Solution
A method involving a replica mold manufacturing process where a curable composition is filled between a replica blank and a master mold, cured, and then separated, with a step between the pattern region and the pattern peripheral region, and the area of the replica pattern portion at the bonding interface being larger than the pattern region, ensuring controlled filling and separation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the thickness of the replica pattern portion is increased to reduce damage from foreign substances, then the reliability of the replica mold is improved, but the controllability of the outer peripheral portion of the liquid film deteriorates
Solution Approach 1:
The master mold is divided into a pattern region and a pattern peripheral region, with the pattern peripheral region having a lower position than the pattern region. This segmentation creates a step structure that acts as a barrier to control the liquid film, allowing the replica pattern portion to have sufficient thickness for damage resistance while maintaining controllability through the step structure.
Solution Approach 2:
The pattern peripheral region serves as an intermediary structure between the pattern region and the replica blank. It mediates the liquid film formation by providing a stepped interface that controls the outer peripheral portion of the liquid film, enabling both thick replica pattern portion and good controllability.
2Manufacturing precision
If the area of the replica pattern portion at the bonding interface is increased to improve controllability, then the manufacturing precision is improved, but the strength of the replica pattern portion decreases
Solution Approach 1:
The master mold is designed with different local qualities: the pattern region has a higher position for strong bonding, while the pattern peripheral region has a lower position for liquid film control. This local differentiation allows the replica pattern portion to achieve both good controllability and sufficient strength at the bonding interface.
Solution Approach 2:
The solution moves to another dimension by creating a vertical step between the pattern region and pattern peripheral region. This vertical dimensionality allows the bonding interface to have a larger area for strength while the horizontal dimension maintains controllability through the step structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the controllability of the outer peripheral portion of the liquid film, reducing damage to the replica mold and maintaining the integrity of the replica pattern portion, thereby reducing manufacturing defects and costs.
Implementation Method 1
curing the curable composition to form a replica pattern portion with a pattern of the pattern region transferred thereto
Data Source
AI summary
A method of manufacturing a replica mold includes filling a curable composition into a space between a replica blank and a pattern region of a master mold; curing the curable composition to form a replica pattern portion with a pattern of the pattern region transferred thereto; and separating the replica pattern portion and the master mold from each other. The master mold includes a pattern peripheral region surrounding the pattern region, and there is a step between the pattern region and the pattern peripheral region, and an area of the replica pattern portion at a bonding interface between the replica blank and the replica pattern portion is larger than an area of the pattern region.