Actinic-Ray Resin Composition with Basic Compound Mediator
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Solution Overview
Problem
Current actinic-ray- or radiation-sensitive resin compositions used in semiconductor and photofabrication processes, especially with ArF excimer laser light, face challenges in developability, exposure latitude, and line edge roughness due to the high hydrophobicity of perfluoroalkylsulfonic acids, leading to decreased sensitivity and development residues.
Innovation Solution
A radiation-sensitive resin composition comprising a basic compound with multiple basic groups and acid-generating groups, where the number of acid-generating groups exceeds the number of basic groups, along with a resin whose dissolution rate in an alkali developer is increased by acid action, enhancing developability and exposure latitude.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If perfluoroalkylsulfonic acids are used to generate stronger acids for resin with alicyclic hydrocarbon groups, then acid strength is improved, but developability deteriorates due to high hydrophobicity
Solution Approach 1:
The patent introduces an amine compound as an intermediary substance that mediates between the hydrophobic perfluoroalkylsulfonic acid and the aqueous developer. The amine compound forms a complex with the perfluoroalkylsulfonic acid, creating a more hydrophilic species that can interact better with aqueous developers while still maintaining the desired acid strength for resin modification.
Solution Approach 2:
The patent changes the chemical parameters of the acid system by introducing amine compounds that modify the properties of perfluoroalkylsulfonic acids. This parameter change transforms the highly hydrophobic acid into a system with improved hydrophilicity and developability, while preserving the essential acid strength needed for the alicyclic hydrocarbon group resin.
2Productivity
If perfluoroalkylsulfonic acids are used to enhance sensitivity, then exposure sensitivity is improved, but development residues occur due to poor affinity to aqueous developers
Solution Approach 1:
The amine compound serves as a mediator that prevents the formation of development residues by facilitating proper interaction between the perfluoroalkylsulfonic acid system and the aqueous developer. This intermediary prevents the accumulation of hydrophobic residues that would otherwise remain after development.
Solution Approach 2:
The patent converts the harmful hydrophobicity of perfluoroalkylsulfonic acids into a beneficial property by using amine compounds to create a balanced system. The originally harmful hydrophobic interaction is transformed into a controlled interaction that maintains sensitivity while enabling proper developer affinity and residue-free development.
3Manufacturing precision
If stronger acids are used to improve pattern fineness, then resolution is improved, but exposure latitude deteriorates due to high hydrophobicity
Solution Approach 1:
The patent applies parameter changes to the acid system by introducing amine compounds that adjust the hydrophilicity-hydrophobicity balance. This allows the system to maintain the strong acid properties needed for fine pattern resolution while gaining the adaptability and exposure latitude required for versatile photolithography processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition improves developability, exposure latitude, and line edge roughness performance, addressing the limitations of existing resin compositions by optimizing acid generation and alkali solubility, resulting in better pattern formation with ArF excimer laser light.
Implementation Method 1
a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid
Implementation Method 2
a resin (B) whose dissolution rate in an alkali developer is increased by the action of an acid
Data Source
AI summary
According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n≧1, m≧2 and n<m.