Resin Composition for Semiconductor Resist Exposure Latitude
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Solution Overview
Problem
The existing chemically amplified resist compositions used in semiconductor manufacturing lack sufficient exposure latitude, which is crucial for precise pattern formation in microfabrication processes.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive resin composition is developed, incorporating a resin with a specific structure represented by General Formula (1), which includes a repeating unit capable of increasing polarity upon acid action, along with a photoacid generator, to enhance exposure latitude and pattern formation accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resist composition with a maleimido group is used, then the polarity increases upon acid decomposition, but the exposure latitude becomes insufficient
Solution Approach 1:
The patent changes the chemical structure parameters of the resin by introducing a specific repeating unit with a nitrogen-containing six-membered ring and a carbonyl group, which modifies the acid-base characteristics and polarity changes during decomposition, thereby improving both exposure latitude and pattern formation precision
Solution Approach 2:
The patent creates a composite resist composition by combining the specifically structured resin with a photoacid generator and other components, where the interaction between these components produces the desired balance of exposure latitude and manufacturing precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new resin composition achieves excellent exposure latitude, preventing acid diffusion into unexposed areas and improving the precision of pattern formation, thereby enhancing the manufacturing process for electronic devices.
Implementation Method 1
a photoacid generator, to enhance exposure latitude and pattern formation accuracy
Implementation Method 2
a resin including a repeating unit represented by General Formula (1) and capable of increasing a polarity by an action of an acid
Data Source
AI summary
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.