Radiation-Sensitive Resin Composition for Lithography
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Solution Overview
Problem
Current radiation-sensitive resin compositions face challenges in achieving balanced lithography performance, particularly in resisting pattern collapse after development, Line Width Roughness (LWR), and Mask Error Enhancement Factor (MEEF), while maintaining transparency to radioactive rays.
Innovation Solution
A radiation-sensitive resin composition incorporating a specific compound represented by formula (1) and a base polymer, which includes a monovalent hydrocarbon group and a radiation-degradable monovalent cation, enhancing resistance to pattern collapse and improving LWR and MEEF through chemical amplification effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If a radiation-sensitive resin composition contains a polymer with norbornane ring derivative, then sensitivity to radioactive rays is improved, but resistance to pattern collapse and LWR performance deteriorate
Solution Approach 1:
The patent changes the chemical structure parameters of the resin composition by introducing a polymer with specific structural units (formula 1) that have balanced chemical properties. This polymer contains both acid-generating capability and structural features that provide mechanical stability, thereby improving pattern collapse resistance while maintaining sensitivity.
Solution Approach 2:
The patent creates a composite resin composition by combining the polymer with specific structural units (formula 1) with other resin components and additives. This composite approach allows the composition to exhibit both high sensitivity to radioactive rays and improved resistance to pattern collapse through synergistic effects of the different components.
2Use of energy by moving object
If a radiation-sensitive resin composition contains a polymer with norbornane ring derivative, then sensitivity to radioactive rays is improved, but Line Width Roughness (LWR) performance deteriorates
Solution Approach 1:
The patent modifies the chemical composition parameters by incorporating a polymer with specific structural units (formula 1) that have controlled molecular weight and functional group distribution. This results in more uniform acid generation and polymerization behavior, reducing line width roughness while preserving sensitivity.
Solution Approach 2:
The patent introduces local structural features through the polymer's repeating units (formula 1) that create localized regions of controlled reactivity and physical properties. This local quality control ensures uniform exposure response and reduces variability in line width, improving LWR performance.
3Use of energy by moving object
If a radiation-sensitive resin composition contains a polymer with norbornane ring derivative, then sensitivity to radioactive rays is improved, but Mask Error Enhancement Factor (MEEF) performance deteriorates
Solution Approach 1:
The patent adjusts the chemical parameters of the resin composition by using a polymer with specific structural units (formula 1) that have optimized functional group content and molecular architecture. This results in more predictable and uniform acid-catalyzed reactions, reducing mask error enhancement while maintaining high sensitivity.
Solution Approach 2:
The patent incorporates structural features in the polymer (formula 1) that create self-regulating chemical amplification behavior. The acid-generating and acid-reactive groups work in a coordinated feedback mechanism that ensures uniform pattern formation and minimizes error amplification from mask variations.
4Measurement precision
If a radiation-sensitive resin composition is designed for higher integrity microfabrication, then lithography resolution is improved, but balanced performance across multiple parameters deteriorates
Solution Approach 1:
The patent designs a polymer with structural units (formula 1) that perform multiple functions simultaneously: generating acid upon irradiation, providing mechanical strength to resist pattern collapse, and ensuring uniform reaction for low LWR and MEEF. This multi-functionality achieves balanced performance across all critical lithography parameters.
Solution Approach 2:
The patent creates a composite resin system that combines the multifunctional polymer (formula 1) with complementary components, where each component addresses specific performance requirements. This composite approach enables simultaneous optimization of resolution, pattern collapse resistance, LWR, and MEEF performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition provides a resist film with improved resistance to pattern collapse and balanced lithography performance, maintaining transparency and sensitivity to radioactive rays, thereby addressing the limitations of existing technologies.
Implementation Method 1
an acid generating agent which is a component that generates an acid by irradiation with a radioactive ray
Implementation Method 2
utilizes a chemical amplification effect between these components
Data Source
AI summary
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).