Actinic-Ray-Sensitive Resin Composition for Nanopattern Resolution
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current actinic-ray or radiation-sensitive resin compositions used in ultramicrolithography and photofabrication processes face challenges in achieving high sensitivity, high resolution, and favorable dry etching resistance, particularly in forming isolated nanopatterns with electron beams or extreme ultraviolet exposure, due to issues like poor dry etching resistance and resolution deterioration.
Innovation Solution
A radiation-sensitive resin composition comprising a compound with a phenolic hydroxyl group and a cyclic structure containing an acid crosslinking group, such as a polycyclic structure or a cyclic structure with a hydroxymethyl or alkoxymethyl group, which enhances dry etching resistance and resolving power by forming a hard film that inhibits acid diffusion and improves pattern shape and line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the thickness of the resist film is reduced to form nanopatterns, then the resolution is improved, but the dry etching resistance deteriorates
Solution Approach 1:
The patent introduces a novel resin composition with specific chemical structure parameters (polycyclic structures with formula (1) where n=1-4, and formula (2) with m=1-5) to achieve optimal balance between film thickness and dry etching resistance. By controlling the molecular weight (1000-5000) and the ratio of repeating units, the composition maintains sufficient etching resistance even at reduced film thickness for nanopattern formation.
Solution Approach 2:
The patent creates a composite resin system combining two types of repeating units: (P) with phenolic hydroxyl groups and (Q) with acid crosslinking groups. This composite structure provides both the necessary resolution for nanopatterns and enhanced dry etching resistance through the synergistic effects of the different functional groups, solving the contradiction between thin film requirements and etching resistance.
2Manufacturing precision
If the acceleration voltage of electron beams is increased to reduce forward scattering, then the resolution is improved, but the sensitivity deteriorates due to lower electron energy trapping ratio
Solution Approach 1:
The patent modifies the resin's chemical composition parameters to increase electron energy trapping efficiency. The specific polycyclic structures and functional groups (phenolic hydroxyl, acid crosslinking) create more effective trapping sites for electron energy, allowing high resolution at lower acceleration voltages while maintaining good sensitivity.
3Manufacturing precision
If the acceleration voltage is increased to reduce forward scattering, then the resolution is improved, but the backward scattering influence increases due to reflected electrons
Solution Approach 1:
The patent converts the potentially harmful backward scattering effect into a beneficial outcome. The resin composition is designed to utilize reflected electrons for additional crosslinking reactions, transforming the harmful backward scattering into useful energy that enhances pattern formation and reduces line edge roughness.
4Manufacturing precision
If a resin with aromatic skeleton or oxirane group is used to improve resolution, then the resolving power is improved, but the dry etching resistance becomes unsatisfactory
Solution Approach 1:
The patent develops a composite resin system that integrates the resolving power benefits of aromatic structures with the dry etching resistance of crosslinkable groups. The specific combination of repeating units (P) and (Q) with defined ratios creates a material that simultaneously achieves high resolution and satisfactory dry etching resistance, overcoming the limitations of previous single-structure resins.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high sensitivity, resolution, and minute line edge roughness while maintaining favorable dry etching resistance, effectively addressing the limitations of existing technologies in forming isolated nanopatterns with electron beams or extreme ultraviolet exposure.
Implementation Method 1
a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group
Implementation Method 2
the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group
Implementation Method 3
actinic-ray- or radiation-sensitive resin composition comprising a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group
Data Source
AI summary
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.