Radiation-Sensitive Resin Composition for Low Post-Etch LWR
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions using onium salts with anions having a conjugate acid pKa of 2.0 or more exhibit high line width roughness (LWR) after etching, which is undesirable for ultrafine pattern formation in semiconductor fabrication.
Innovation Solution
A method involving passing an acid compound with a pKa of 2.0 or more through an ion-exchange resin, producing an onium salt, and mixing it with a resin to form a composition that suppresses protonation and enhances post-etching LWR performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an onium salt including an anion whose conjugate acid has a pKa of 2.0 or more is used in a resist composition, then the resist composition can be produced, but the etched pattern exhibits large line width roughness (LWR)
Solution Approach 1:
The invention changes the pH parameter of the resist composition by adding a base compound, thereby controlling the protonation state of the onium salt. This parameter change suppresses premature protonation while maintaining the desired anion characteristics, resolving the contradiction between using onium salts with pKa≥2.0 and achieving low LWR
Solution Approach 2:
The base compound acts as an intermediary that mediates between the onium salt and the etching process. It buffers the system to prevent excessive protonation during storage and handling, while still allowing the onium salt to function properly during etching, thus improving post-etching LWR performance
2Manufacturing precision
If conventional purification methods such as passing through anion-exchange resin or washing with acid are used, then the onium salt is purified, but protonation occurs which degrades post-etching LWR performance
Solution Approach 1:
Instead of using conventional acid-based or anion-exchange purification methods that cause protonation, the invention inverts the approach by using a base compound to counteract protonation. This reverse strategy maintains purification benefits while preventing the harmful protonation effect, thereby preserving post-etching LWR performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method produces a resin composition with improved post-etching LWR performance, suitable for forming ultrafine patterns in semiconductor devices.
Implementation Method 1
passing an acid compound with a pKa of 2.0 or more through an ion-exchange resin column
Implementation Method 2
mixing the resulting onium salt with a resin that increases in polarity due to acid action
Data Source
AI summary
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.