Radiation-Sensitive Resin Composition for High-Resolution Resist Patterns
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing radiation-sensitive resin compositions face challenges in achieving high sensitivity, line width uniformity (LWR) performance, and critical dimension uniformity (CDU) performance for advanced photolithography processes, particularly with next-generation technologies using shorter wavelength radiation.
Innovation Solution
Incorporation of an onium salt compound with a specific structure into a radiation-sensitive resin composition, which includes a solvent and optionally an acid diffusion controlling agent, enhances the sensitivity, LWR performance, and CDU performance by utilizing a strong acid generated from an electron-withdrawing group and ester bond structures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional photolithography methods are used with standard resist compositions, then existing process compatibility is maintained, but sensitivity and resolution are insufficient for next-generation short-wavelength radiation
Solution Approach 1:
The patent modifies the chemical parameters of the photoacid generator by substituting proximal carbon atoms with fluorine atoms. This parameter change in the molecular structure creates a strong acid photoacid generator that achieves both high sensitivity and high resolution for short-wavelength radiation exposure, resolving the contradiction between sensitivity and resolution requirements.
2Reliability
If fluorine substitution is introduced to create strong acid photoacid generators, then sensitivity and resolution improve, but molecular structure complexity increases
Solution Approach 1:
The patent applies local quality by introducing fluorine substitution only at specific proximal carbon positions relative to the sulfonic acid group, rather than throughout the entire molecule. This localized modification achieves the desired strong acid properties and improved sensitivity while minimizing overall molecular structure complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high-quality resist patterns with improved sensitivity, LWR, and CDU performance, enabling efficient formation of fine circuits in semiconductor devices.
Implementation Method 1
a resist pattern is formed on a substrate by generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern
Data Source
AI summary
A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). Rf1 and Rf2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R2, R3, R4, R5, R6, and R7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n1+n2 is an integer of 2 to 8. n3 represents an integer of 0 to 5. X1 and X2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z+ represents a monovalent radiation-sensitive onium cation.