Resin Composition for Semiconductor Resist with High Depth of Focus
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Solution Overview
Problem
Existing resist compositions for semiconductor manufacturing fail to meet the required levels of depth of focus (DOF) and resolving power, particularly in fine processing techniques.
Innovation Solution
A specific active-light-sensitive or radiation-sensitive resin composition is developed, comprising a resin with a repeating unit that decomposes to generate a polar group and another unit with a lactone, sultone, or carbonate structure, ensuring a content of at least 35% of the first unit and excluding certain groups, to enhance DOF and resolving power.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used for fine processing, then manufacturing process can be maintained, but depth of focus and resolving power do not meet required levels
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by specifying a resin with particular repeating units (a1) containing acid-decomposable groups and repeating units (b) with lactone, sultone, or carbonate structures. The mole ratio parameters are precisely controlled (a1: 35-70%, b: 5-65%) to optimize acid diffusion and pattern formation, achieving both high depth of focus and resolving power
Solution Approach 2:
The patent creates a composite resin system combining two types of repeating units with different functions: repeating unit (a1) that decomposes to generate polar groups for solubility change, and repeating unit (b) that provides structural stability. This composite structure enables simultaneous achievement of high resolving power and depth of focus
2Ease of manufacture
If resin structure is simplified to improve manufacturing, then manufacturing ease increases, but acid diffusion and resolving power are compromised
Solution Approach 1:
The patent applies local quality by designing specific functional groups at particular positions in the resin structure. Repeating unit (a1) contains acid-decomposable groups (tert-butyl, triethylmethyl, trimethylsilyl) at specific locations to generate polar groups upon acid exposure, while repeating unit (b) provides structural framework. This localized functional arrangement enables both ease of synthesis and high resolving power
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high depth of focus and excellent resolving power, enabling improved pattern formation in semiconductor manufacturing, as demonstrated by comparison with comparative examples.
Implementation Method 1
a compound that generates an acid upon irradiation with active light or radiation
Implementation Method 2
a repeating unit (a) having a group that decomposes by the action of an acid to generate a polar group
Data Source
AI summary
Provided are an active-light-sensitive or radiation-sensitive resin composition having high depth of focus and excellent resolving power; a pattern forming method using the composition; and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having an acid-decomposable group and a repeating unit (b) having a lactone structure and the like; the repeating unit (a) includes at least a specific repeating unit (a1) represented by General Formula (1); the content of the repeating units (a1) with respect to all the repeating units of the resin (P) is 35% by mole or more; and the resin (P) does not include any of a specific group represented by General Formula (X1), a specific structure represented by General Formula (X2), a hydroxyadamantyl group, and a hydroxyadamantyl group in which a hydroxy group is protected with a group that decomposes by the action of an acid to leave.