Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions struggle to maintain the ability to form a pattern with a good shape profile after long-term storage, leading to degraded performance in pattern formation.
Innovation Solution
Incorporating an onium salt represented by a specific formula, an acid-decomposable resin, and a solvent in the resin composition, which prevents structural decomposition and aggregation of components, ensuring consistent pattern formation even after long-term storage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If conventional actinic ray-sensitive resin compositions are stored for long term, then storage duration increases, but pattern shape profile quality degrades
Solution Approach 1:
The patent applies preliminary action by adding specific stabilizers to the resin composition before storage to prevent decomposition and aggregation of components. These stabilizers are incorporated in advance to maintain component integrity throughout long-term storage, ensuring that no harmful changes occur during the storage period that would affect pattern formation quality.
Solution Approach 2:
The patent uses stabilizers as intermediary substances that mediate between the resin components and environmental factors during storage. These stabilizers prevent direct harmful interactions between components and storage conditions, blocking decomposition and aggregation pathways while allowing the resin to maintain its pattern-forming capabilities throughout extended storage periods.
2Duration of action of stationary object
If resin composition components are stored long term, then availability increases, but structural decomposition and aggregation occur
Solution Approach 1:
The patent applies preliminary action by incorporating stabilizers into the resin composition before storage to prevent decomposition and aggregation of components. These stabilizers are added in advance to maintain component integrity throughout long-term storage, ensuring that no harmful changes occur during the storage period.
Solution Approach 2:
The patent uses stabilizers as intermediary substances that mediate between the resin components and environmental factors during storage. These stabilizers prevent direct harmful interactions, blocking decomposition and aggregation pathways while allowing the resin to maintain its pattern-forming capabilities.
3Loss of time
If conventional resin compositions are used after storage, then storage time increases, but pattern formation ability deteriorates
Solution Approach 1:
The patent applies preliminary action by incorporating stabilizers into the resin composition before storage to prevent decomposition and aggregation of components. These stabilizers are added in advance to maintain component integrity throughout long-term storage, ensuring that no harmful changes occur during the storage period that would affect pattern formation quality.
Solution Approach 2:
The patent uses stabilizers as intermediary substances that mediate between the resin components and environmental factors during storage. These stabilizers prevent direct harmful interactions, blocking decomposition and aggregation pathways while allowing the resin to maintain its pattern-forming capabilities throughout extended storage periods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition maintains the ability to form patterns with a good shape profile even after prolonged storage, enhancing the reliability and consistency of pattern formation processes.
Implementation Method 1
a photoacid generator contained in exposed portions is first decomposed by irradiation with light to generate an acid
Implementation Method 2
alkali-insoluble groups in a resin contained in an actinic ray-sensitive or radiation-sensitive resin composition are converted to alkali-soluble groups by the catalytic action of the acid generated
Data Source
AI summary
A first object of the invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can maintain the ability to form a pattern having a good shape profile even after long-term storage. A second object of the invention is to provide a resist film, a pattern forming method, and an electronic device production method that use the actinic ray-sensitive or radiation-sensitive resin composition described above.The actinic ray-sensitive or radiation-sensitive resin composition of the invention includes an onium salt represented by formula (1), an acid-decomposable resin, and a solvent.


