Resin Composition for Etching Mask Vertical Orientation

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Solution Overview

Problem

Existing methods struggle to form phase-separated structures with vertical orientation and high film thickness suitable for etching mask patterns, particularly as film thickness increases, limiting their application in advanced microfabrication techniques.

Innovation Solution

A resin composition comprising a block copolymer with specific constitutional units and a homopolymer of less than 3,000 number-average molecular weight, where the block copolymer includes a first block and a second block with a random copolymer structure, and a homopolymer with a repeating structure, optimized to achieve vertical orientation and high film thickness for etching mask patterns.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Length of stationary object

If the film thickness is increased to achieve high film thickness for etching mask patterns, then the film thickness is improved, but the vertical orientation of phase-separated structures deteriorates

Engineering Contradiction:

Improvefilm thicknessVSAvoidvertical orientation

Core Design Contradiction:

Length of stationary objectVSStability of the object's composition

Solution Approach 1:

The invention uses a composite resin composition containing both a block copolymer (for phase-separated structure formation) and a specific homopolymer (for vertical orientation control). This composite approach allows the system to achieve both high film thickness and maintained vertical orientation, resolving the contradiction between film thickness and orientation stability.

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The invention changes the chemical composition parameters of the resin system by selecting specific homopolymers with particular glass transition temperatures and molecular weights. By adjusting these parameters, the system maintains vertical orientation even at increased film thicknesses, overcoming the limitation of conventional single-component systems.

Inventive Principle:

Principle #35Parameter changes

2Ease of manufacture

If conventional resin compositions are used, then the manufacturing process is simple, but the ability to form vertically oriented phase-separated structures with high film thickness is insufficient

Engineering Contradiction:

Improveprocess simplicityVSAvoidvertical orientation formation capability

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent employs a composite resin system combining block copolymer and homopolymer components. This composite material approach enhances the vertical orientation formation capability without significantly complicating the manufacturing process, as the components are simply mixed and applied together in a single coating step.

Inventive Principle:

Principle #40Composite materials

3Strength

If the molecular weight of the homopolymer is increased, then the film strength is improved, but the vertical orientation capability deteriorates

Engineering Contradiction:

Improvefilm strengthVSAvoidvertical orientation

Core Design Contradiction:

StrengthVSStability of the object's composition

Solution Approach 1:

The invention optimizes the molecular weight parameter of the homopolymer to be less than 3,000, which is a specific parameter setting that balances film strength and vertical orientation capability. This parameter optimization resolves the contradiction by finding the optimal value that satisfies both requirements simultaneously.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the formation of phase-separated structures with excellent vertical orientation and high film thickness, suitable for use as etching mask patterns, enhancing the resolution and reliability of microfabrication processes.

Implementation Method 1

the block copolymer forms a structure body having a regular periodic structure by the phase separation

Methodology Applied

Scientific EffectPhase separation:

Implementation Method 2

self-organized nanostructures, which are formed by micro-phase separation

Methodology Applied

Scientific EffectSelf-organization: Self-Assembly

Implementation Method 3

micro-phase separation, only in a specific region and arrange the nanostructures in a desired direction

Methodology Applied

Scientific EffectMicro-phase separation:

Data Source

PatentUS20240368393A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask pattern

Publication Date: 2024.11.07 TOKYO OHKA KOGYO CO LTD

AI summary

A resin composition for forming an etching mask pattern containing a block copolymer having a first block and a second block, and a homopolymer having a number-average molecular weight of less than 3,000. The first block is a polymer of a constitutional unit represented by Formula (b1) and the second block is a random copolymer of a constitutional unit represented by Formula (b2m) and a constitutional unit represented by Formula (b2g). The proportion of the volume of the first block is 20% to 80% by volume. The homopolymer includes a polymer of the constitutional unit represented by Formula (b1). In the formulas illustrated below, R1 is an alkyl group, Rb1 is a hydrogen atom or a methyl group, n is an integer of 0 to 5, R2 is an alkyl group, R3 is an alkylene group, Rb2 is a hydrogen atom or the like, and x is more than 0 and less than 1