Photocrosslinkable Resin for Low-Exposure Alkaline Patterning
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Solution Overview
Problem
Existing resins used in organic electronic devices are not photocrosslinkable at low light exposure intensity and are not soluble in alkaline solutions, leading to performance degradation and limitations in substrate selection.
Innovation Solution
A resin with a specific structure containing a photocrosslinkable group, fluorine atom, acidic functional group, and hydrophilic functional group, allowing for solubility in alkaline solutions and insolubility upon photocrosslinking at low light exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a resin is used that is not photocrosslinkable at low light exposure intensity, then high light exposure intensity is required, but this causes performance degradation of electronic devices
Solution Approach 1:
The patent introduces a photocrosslinkable group with specific molecular structure (cinnamyl, coumarin, or oxadiazole groups) that changes its photochemical parameters to enable efficient crosslinking at low light exposure intensity (5-500 mJ/cm²), thereby resolving the contradiction between required light intensity and device performance
Solution Approach 2:
The patent creates a composite resin system combining polymer chains with embedded photocrosslinkable functional groups, achieving both low-light photocrosslinkability and maintaining electrical insulation properties, thus resolving the contradiction between photoreactivity and device performance
2Ease of manufacture
If a resin is used that is not soluble in alkaline solution, then pattern formation becomes difficult, but using a soluble resin is required for proper patterning
Solution Approach 1:
The patent introduces acidic functional groups (carboxyl, sulfonic acid, phosphonic acid) at specific locations on the polymer chain that provide local solubility in alkaline solutions for pattern formation, while the bulk polymer structure maintains stability and insolubility after photocrosslinking
Solution Approach 2:
The patent incorporates hydrophilic functional groups (hydroxyl, ether, amide) that enable preliminary dissolution in alkaline solutions before photocrosslinking, allowing pattern formation to proceed, while the photocrosslinkable groups subsequently create insoluble crosslinked structures in the patterned regions
3Temperature
If high-temperature treatment is used for curing, then the resin can be cured, but this causes a decrease in performance of electronic devices
Solution Approach 1:
The patent replaces thermal curing mechanism with photochemical crosslinking mechanism, using light energy instead of thermal energy to initiate polymerization, thereby eliminating high-temperature treatment and preserving electronic device performance
Solution Approach 2:
The patent changes the curing parameter from temperature-dependent thermal activation to light-wavelength-dependent photochemical activation, enabling curing at ambient temperatures while maintaining complete crosslinking efficiency
4Object-affected harmful factors
If a resin is used that does not have liquid-repellency, then ink leakage occurs beyond the pattern region, but liquid-repellency is needed to prevent leakage
Solution Approach 1:
The patent creates a thin film structure through photocrosslinking that forms a physical barrier with liquid-repellent properties, preventing ink leakage beyond the pattern region while maintaining the flexibility needed for electronic device applications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resin achieves liquid-repellency and solubility in alkaline solutions, preventing performance degradation of electronic devices and enabling efficient pattern formation without high-temperature treatments.
Implementation Method 1
a repeating unit that is represented by Formula (1) below including a photocrosslinkable group
Implementation Method 2
one or more units selected from the group consisting of a repeating unit that includes a fluorine atom
Implementation Method 3
a repeating unit that includes an acidic functional group
Data Source
AI summary
An object of an aspect of the present invention is to provide a resin that has liquid-repellency and high solubility in an alkaline solution, and becomes insoluble in the solvent by photocrosslinking at low light exposure intensity. A resin in accordance with an aspect of the present invention contains: a repeating unit that is represented by Formula (1) including a photocrosslinkable group; and one or more units selected from the group consisting of a repeating unit that includes a fluorine atom, a repeating unit that includes an acidic functional group and a repeating unit that includes a hydrophilic functional group,where R1 represents hydrogen or methyl, L1 represents a single bond or a linking group, A represents a linking group, and R2 through R6 represent one selected from the group consisting of hydrogen, halogen, alkyl, alkyl halide, alkoxy, aryl, aryloxy, cyano, and amino.