Photocurable Resin Mold Release Agent for Imprint Bubble Control
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Solution Overview
Problem
Existing photo imprint technologies face challenges in achieving uniform resin pattern thickness and high productivity due to bubble formation between the mold and the photocurable resist, leading to unintended shape distortions and increased mold releasing force.
Innovation Solution
A photocurable composition comprising a (meth)acrylate monomer, a photopolymerization initiator, and a mold releasing agent with high saturated solubility in condensable gases, which reduces the mold releasing force by segregating at the interface and concentrating the gas, thereby minimizing bubble formation and improving pattern transfer accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resist is applied onto a substrate by an ink jet method and the arrangement of resist droplets is optimized, then the residual film thickness uniformity is improved, but bubbles remain between the pattern portion and the resist
Solution Approach 1:
A mold releasing agent is introduced as an intermediary substance between the photocurable composition and the mold. This releasing agent has high solubility in the condensable gas, allowing it to effectively dissolve the gas and facilitate bubble removal during the imprinting process, thereby resolving the contradiction between achieving uniform film thickness and eliminating bubbles.
Solution Approach 2:
The invention changes the chemical composition parameters of the photocurable system by incorporating a mold releasing agent with specific solubility characteristics in condensable gas. This parameter change enables the system to dissolve and eliminate bubbles while maintaining uniform residual film thickness after curing.
2Object-generated harmful factors
If condensable gas is introduced between the mold and substrate to remove bubbles, then bubble removal is improved, but the mold releasing force becomes large
Solution Approach 1:
The mold releasing agent acts as a mediator that reduces the adhesion between the cured photocurable composition and the mold. By having high solubility in the condensable gas, it enhances bubble removal while simultaneously reducing the releasing force required, thus resolving the contradiction between effective bubble removal and easy mold separation.
Solution Approach 2:
The invention creates a composite system combining the photocurable composition with a mold releasing agent that has specific solubility properties in condensable gas. This composite material formulation enables both effective bubble removal during imprinting and reduced releasing force after curing, addressing both requirements simultaneously.
3Object-generated harmful factors
If a standby time is required until the remaining bubbles disappear, then bubble removal is improved, but productivity decreases
Solution Approach 1:
The mold releasing agent serves as an active intermediary that accelerates bubble removal during the imprinting process itself, rather than requiring a separate standby time for bubble disappearance. This allows bubble elimination to occur concurrently with the imprinting operation, maintaining high productivity while effectively removing bubbles.
Solution Approach 2:
The invention enables continuous operation by having the mold releasing agent work throughout the imprinting process to eliminate bubbles in real-time. This eliminates the need for interrupting production for standby time, thereby maintaining continuous productive action while achieving complete bubble removal.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the production of cured films with reduced mold releasing force, improved pattern transfer accuracy, and enhanced productivity by minimizing bubble formation and ensuring uniform film thickness.
Implementation Method 1
The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more
Implementation Method 2
a component (B) which is a photopolymerization initiator
Data Source
AI summary
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.