Resin Composition for Phase-Separated Structures

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Solution Overview

Problem

Current methods for forming patterns using phase-separated structures formed by block copolymers require preparing block copolymers with specific structural periods for each pitch, limiting their application to multiple-pitch designs and increasing the risk of pattern defects.

Innovation Solution

A resin composition for forming a phase-separated structure is developed, comprising a block copolymer A and a block copolymer B, with a specific ratio of their structural periods (L0B/L0A) ranging from 0.70 to 1.20, allowing for the formation of patterns with multiple pitches without defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If block copolymers with specific structural periods are prepared for each pitch, then pattern formation for each pitch is achieved, but the complexity of preparing multiple block copolymers increases and adaptability to multiple-pitch designs is reduced

Engineering Contradiction:
Improvepattern formation precisionVSAvoidblock copolymer preparation complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies universality by developing a single block copolymer composition that can form phase-separated structures for multiple different pitches. Instead of preparing separate block copolymers for each pitch requirement, the invention uses one composition with controlled molecular weight distribution that can adapt to form patterns at different scales, thereby reducing preparation complexity while maintaining manufacturing precision across multiple applications

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent utilizes parameter changes by adjusting the molecular weight distribution characteristics of the block copolymer to control the structural period. By optimizing the weight average to number average molecular weight ratio (Mw/Mn) and other parameters within specific ranges, the same block copolymer composition can produce phase-separated structures with different structural periods suitable for multiple pitches without requiring different compositions

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If a single block copolymer composition is used for multiple pitches, then adaptability is improved, but the risk of pattern defects increases due to insufficient process margin

Engineering Contradiction:
Improvemulti-pitch design capabilityVSAvoidpattern defect risk
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The patent applies parameter changes by establishing specific ranges for molecular weight distribution (Mw/Mn ratio between 1.05-2.0) and other composition parameters that provide sufficient process margin. These controlled parameter variations ensure that the block copolymer maintains stable phase separation behavior across different processing conditions and pitch requirements, thereby reducing pattern defects while achieving multi-pitch adaptability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements beforehand cushioning by pre-optimizing the molecular weight distribution and composition parameters of the block copolymer to create a robust formulation that is inherently resistant to processing variations. This pre-established buffer in the material properties allows for successful pattern formation at multiple pitches even when processing conditions vary, thereby reducing defect risk before problems occur

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed resin composition improves the process margin, enabling the formation of patterns with multiple pitches without generating defects, and allows for greater flexibility in designing nanostructures with controlled position and orientation.

Implementation Method 1

a block copolymer A and a block copolymer B, the block copolymer A being a block copolymer in which a first block a, a second block a, and a third block a are bonded together, the block copolymer B being a block copolymer in which a first block b and a second block b are bonded together

Methodology Applied
Scientific EffectPhase separation:

Data Source

PatentUS20250066636A1Resin composition for forming phase-separated structure and method for producing structure having phase-separated structure
Publication Date: 2025.02.27 TOKYO OHKA KOGYO CO LTD
  • US20250066636A1 patent drawing
  • US20250066636A1 patent drawing
  • US20250066636A1 patent drawing

AI summary

A resin composition for forming a phase-separated structure that can improve a process margin. A resin composition for forming a phase-separated structure containing a predetermined block copolymer A and a predetermined block copolymer B, the composition having a ratio (L0B/L0A) of L0 of the block copolymer B (L0B) to L0 of the block copolymer A (L0A) of 0.70 or more and 1.20 or less.