Resin Composition with Secondary Amine Monomers for Low-Temperature Curing
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Solution Overview
Problem
High-temperature curing processes in display manufacturing lead to yellowing of polymer films and substrate deformation, which are difficult to address with existing low-temperature resin compositions, especially in flexible displays.
Innovation Solution
A resin composition comprising an initiator, multifunctional monomers with secondary amine groups, a resin, a solvent, and an agent, which allows for low-temperature curing of photoresists, reducing yellowing and substrate deformation by accelerating the curing reaction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high-temperature heat curing process is used for photo spacer, then curing effect is improved, but polymer film yellowing occurs which affects chroma and panel color gamut performance
Solution Approach 1:
The patent changes the curing temperature parameter from high temperature to low temperature (20-90°C) by using a specifically designed photoresist composition containing secondary amine group monomers, thereby achieving effective curing without causing yellowing of the polymer film
Solution Approach 2:
The patent uses a composite photoresist composition comprising multiple components including secondary amine group monomers, acrylic monomers, and specific initiators, which work together to enable low-temperature curing while maintaining curing effectiveness and preventing yellowing
2Object-affected harmful factors
If material adjustment is made to improve extreme chroma performance, then chroma performance is improved, but development time increases and formulation becomes difficult
Solution Approach 1:
The patent systematically optimizes the composition parameters of the photoresist, including the types and ratios of monomers and initiators, to achieve low-temperature curing capability while maintaining good chroma performance, thereby avoiding lengthy material adjustment processes
Solution Approach 2:
The patent introduces secondary amine group monomers as intermediary compounds that facilitate low-temperature curing reactions, acting as a mediator between the initiator and acrylic monomers to enable effective curing at lower temperatures without requiring extensive material adjustments
3Object-affected harmful factors
If low-temperature curing is implemented, then yellowing is reduced, but curing reaction rate may be insufficient
Solution Approach 1:
The patent employs a composite photoresist system combining secondary amine group monomers with acrylic monomers and specific initiators, where the synergistic interaction of components compensates for the lower reaction rate at low temperatures while preventing yellowing
Solution Approach 2:
The patent optimizes the molecular structure parameters of the monomers, particularly using secondary amine groups that enhance reactivity, and adjusts initiator selection to maintain adequate curing reaction rates at low temperatures without causing yellowing
4Reliability
If high-temperature curing is used in flexible displays, then curing is achieved, but substrate deformation occurs
Solution Approach 1:
The patent changes the curing temperature parameter to low temperature (20-90°C) range, which is sufficient to achieve complete curing of the photoresist while remaining below the temperature threshold that would cause deformation of flexible display substrates
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables effective low-temperature curing of photoresists, reducing high-temperature yellowing and substrate deformation in flexible displays, thereby improving color gamut performance and process efficiency.
Implementation Method 1
The cured photoresist is formed by curing a resin composition with light at low temperature
Data Source
AI summary
The present disclosure provides a resin composition, a cured photoresist and a display panel. The resin composition includes an initiator, at least one multifunctional monomer, a resin, a solvent, and an agent; wherein the multifunctional monomer comprises a monomer compound with the secondary amine group. Through the above-mentioned method, the present disclosure can realize the low-temperature curing of a photoresist, and can further reduce the phenomenon of high-temperature yellowing of the organic flat layer material during the subsequent curing process, and the high-temperature deformation of the substrate can be avoided in the application of flexible displays.