Radiation-Sensitive Resin Stirring for Defect-Free Patterns

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Solution Overview

Problem

Radiation-sensitive resin compositions used in semiconductor manufacturing often develop defects, such as dents or chips, during long-term storage, leading to pattern formation issues.

Innovation Solution

A method for producing a radiation-sensitive resin composition using a stirring device with a specific configuration, including a stirring tank and a stirrer with a rotatable shaft, support parts, and stirring elements arranged to optimize acid generator distribution, which improves stirring efficiency and reduces pattern defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Duration of action of stationary object

If a radiation-sensitive resin composition is stored for a long period, then the composition can be used after production, but defects such as dents or chips appear in the formed patterns

Engineering Contradiction:
Improvestorage periodVSAvoidpattern quality
Core Design Contradiction:
Duration of action of stationary objectVSManufacturing precision

Solution Approach 1:

The patent applies preliminary action by optimizing the stirring process before storage to prevent future defects. Specifically, the stirrer design with multiple stirring elements and the controlled stirring speed (50-500 rpm for 1-24 hours) ensure complete mixing and homogeneous distribution of acid generators in the resin composition before it is stored. This preliminary thorough mixing prevents aggregation and settling during long-term storage, thereby maintaining pattern quality after extended storage periods.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent applies parameter changes by modifying the stirring conditions including stirring speed (50-500 rpm), stirring time (1-24 hours), and stirrer configuration (multiple stirring elements at different positions). These parameter optimizations ensure homogeneous mixing of the resin composition, preventing defect formation during long-term storage while maintaining pattern quality in lithographic applications.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If a conventional stirrer is used to mix the resin composition, then the mixing process is simple, but the acid generator distribution remains non-uniform leading to pattern defects

Engineering Contradiction:
Improvemixing process simplicityVSAvoidcomponent distribution uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies segmentation by dividing the stirrer into multiple independent stirring elements positioned at different locations within the stirring tank. This segmented configuration ensures comprehensive coverage and uniform mixing of the resin composition, preventing acid generator aggregation while maintaining a relatively simple overall manufacturing process.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies dynamics by implementing a controllable stirring speed range (50-500 rpm) and extended stirring time (1-24 hours). This dynamic approach allows optimization of mixing effectiveness to achieve homogeneous acid generator distribution throughout the resin composition, improving pattern quality without significantly complicating the manufacturing process.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively suppresses the generation of defects in patterns formed after long-term storage by ensuring uniform component distribution and improved solubility of acid generators, resulting in higher quality pattern formation.

Implementation Method 1

a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer

Methodology Applied
Scientific EffectStirring: Stirring

Data Source

PatentUS12061415B2Method for producing radiation-sensitive resin composition and pattern forming method
Publication Date: 2024.08.13 FUJIFILM CORP
  • US12061415B2 patent drawing
  • US12061415B2 patent drawing
  • US12061415B2 patent drawing

AI summary

A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).