Resist Composition Acid Amplifier Miniaturization

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Solution Overview

Problem

Existing methods for miniaturizing semiconductor resist patterns face limitations in further reducing pattern size due to insufficient acid supply from the first resist pattern, which hinders the formation of a sufficiently crosslinked second resist layer, leading to inadequate miniaturization of the opening size.

Innovation Solution

A resist composition containing a crosslinking material crosslinked in the presence of an acid and an acid amplifier is used, along with a solvent, to enhance acid amplification and ensure sufficient acid generation for crosslinking, allowing for the formation of a finer opening pattern by diffusing acid from the first resist pattern into the second resist layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a second resist layer is formed using only acid supplied from the first resist pattern, then the process is simple, but the acid amount is insufficient for adequate crosslinking and miniaturization

Engineering Contradiction:

Improveopening size miniaturizationVSAvoidacid amount

Core Design Contradiction:

Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent incorporates an acid amplifier substance in advance within the second resist layer formulation. When acid diffuses from the first resist pattern, the acid amplifier actively generates additional acid molecules through catalytic reactions, ensuring sufficient acid concentration for complete crosslinking of the crosslinkable group without requiring external acid supply

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent changes the chemical composition parameters of the second resist layer by incorporating specific acid amplifier substances (such as sulfonic acid compounds or carboxylic acid compounds) that can amplify the acid signal. This parameter change enables the system to convert a small initial acid amount into a sufficient acid concentration for effective crosslinking and pattern miniaturization

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If the exposure wavelength is decreased to achieve finer patterns, then the pattern resolution improves, but the production cost increases and technical limitations are encountered

Engineering Contradiction:

Improvepattern sizeVSAvoidproduction cost

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent introduces a chemical intermediary mechanism (acid amplifier and crosslinking reaction) that acts as a mediator between the exposure process and the final pattern formation. The acid amplifier substance amplifies the acid signal generated during exposure, enabling effective crosslinking and pattern definition without requiring extreme wavelength reduction, thus avoiding the associated cost increases and technical limitations

Inventive Principle:

Principle #24Intermediary (Mediator)

3Manufacturing precision

If acid diffusion is enhanced to improve crosslinking, then the crosslinked layer formation improves, but uncontrolled diffusion may occur

Engineering Contradiction:

Improvecrosslinked layer formationVSAvoidacid distribution control

Core Design Contradiction:

Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent employs local quality control by incorporating the acid amplifier substance specifically within the second resist layer formulation, ensuring that acid amplification occurs only where needed - at the interface between the first and second resist layers. The crosslinking reaction is localized to regions where acid diffuses from the first resist pattern, providing precise spatial control over the crosslinked layer formation while preventing uncontrolled diffusion elsewhere

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the formation of a second resist pattern with a more miniaturized opening size, effectively overcoming the limitations of previous techniques by ensuring sufficient acid supply for crosslinking, resulting in a more precise and miniaturized semiconductor device.

Implementation Method 1

an acid amplifier, which amplifies the acid

Methodology Applied

Scientific EffectAcid amplification: Catalysis

Implementation Method 2

a crosslinking material that is crosslinked in the presence of an acid

Methodology Applied

Scientific EffectCrosslinking reaction: Chemical Bonding

Implementation Method 3

diffusing an acid from the first resist pattern into the second resist layer

Methodology Applied

Scientific EffectDiffusion: Diffusion

Data Source

PatentUS8765353B2Resist composition and method for producing semiconductor device

Publication Date: 2014.07.01 SONY GROUP CORP

AI summary

A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.