Resist Composition Acid Control for Lithography Pattern Quality
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current resist materials face challenges in achieving excellent lithography properties and resist pattern shape, particularly when using bright masks, as excessive acid generation affects unexposed areas, leading to deteriorated pattern quality and contrast in solvent developing processes.
Innovation Solution
A resist composition incorporating a base component that changes solubility under acid action, combined with a basic-compound component and an acid-generator component, including specific compounds represented by general formulas, to control acid generation and improve pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a chemically amplified resist composition is used with an acid-generator component to achieve high resolution and sensitivity, then lithography properties are improved, but excessive acid generation in exposed portions affects unexposed areas, deteriorating pattern quality and contrast in solvent developing processes
Solution Approach 1:
The patent introduces a basic-compound component that selectively reacts with acid in exposed portions through local chemical interaction. This component is present throughout the resist film but only becomes active where acid is generated during exposure, providing localized control over the development process and preventing excessive acid effects in unexposed areas.
Solution Approach 2:
The basic-compound component acts as an intermediary substance between the acid-generator component and the base component. It mediates the acid-base interaction by selectively reacting with generated acid in exposed portions, thereby controlling the overall acid concentration and preventing harmful effects on unexposed areas while maintaining the chemically amplified effect.
2Productivity
If bright masks are used to improve pattern formation, then exposure efficiency is increased, but excessive acid generation at exposed portions leads to deteriorated contrast and pattern quality in solvent developing processes
Solution Approach 1:
The basic-compound component provides a feedback mechanism that automatically responds to acid generation. When acid is generated in exposed portions during bright mask exposure, the basic-compound component reacts with this acid, providing real-time control over the acid concentration and maintaining pattern contrast despite high exposure efficiency.
Solution Approach 2:
The patent changes the chemical parameters of the resist system by introducing a basic-compound component that modifies the acid-base equilibrium. This parameter change allows the system to handle the high acid generation from bright masks while maintaining controlled contrast, as the basic component adjusts the overall acid concentration dynamically.
3Device complexity
If conventional resist compositions are used, then the formulation is simple, but they cannot achieve excellent lithography properties and resist pattern shape in solvent developing processes
Solution Approach 1:
The patent creates a composite resist composition by combining three key components: base component, acid-generator component, and basic-compound component. This composite formulation integrates the advantages of each component to achieve excellent lithography properties and pattern shape in solvent developing processes, overcoming the limitations of simpler conventional formulations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved lithography properties and resist pattern shape by controlling acid generation, enhancing contrast and pattern quality, especially in solvent developing processes, and allowing for the formation of high-contrast contact holes.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Implementation Method 2
a base component (A) which exhibits changed solubility in a developing solution under action of acid
Data Source
AI summary
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).