Resist Composition Acid Diffusion Control EUV Lithography
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Solution Overview
Problem
Current resist compositions face challenges in controlling acid diffusion and maintaining excellent lithography properties, particularly in EUV exposure, where the introduction of aromatic or norbornene groups to increase glass transition temperature can lead to decreased hydrophobicity and solubility, affecting resolution and LWR.
Innovation Solution
A resist composition is developed with a base component containing a resin with specific structural units and an acid generator having a cation moiety with an electron withdrawing group, which generates acid upon exposure, altering solubility in the developing solution, and includes an acid diffusion control agent with a high acid dissociation constant to improve acid diffusion control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If aromatic groups, norbornene groups or adamantyl groups are introduced to raise the glass transition temperature of the polymeric compound, then the thermal stability is improved, but the hydrophobicity is increased causing decrease in dissolution rate and solubility
Solution Approach 1:
The patent changes the chemical structure parameters of the polymeric compound by introducing specific structural units (formula a0 with alicyclic hydrocarbon groups and formula a1 with acid dissociable groups) to achieve optimal balance between glass transition temperature and solubility characteristics for EUV lithography
Solution Approach 2:
The patent creates a composite resist composition combining the polymeric compound with specific acid generators (formula b0 with cation moieties and electron withdrawing groups) and acid diffusion control agents (formula c0 with quaternary ammonium structures) to achieve synergistic effects that resolve the contradiction between thermal stability and solubility
2Stability of the object's composition
If the glass transition temperature of the polymeric compound is raised to improve thermal stability, then the structural stability is improved, but the solubility in developing solution decreases
Solution Approach 1:
The patent optimizes the ratio and structural parameters of different functional units in the polymeric compound, specifically controlling the content of acid dissociable groups while maintaining appropriate glass transition temperature to achieve both structural stability and good solubility characteristics
Solution Approach 2:
The patent introduces acid diffusion control agents as intermediary substances that mediate between the polymeric compound and the developing solution, controlling the acid diffusion process to improve both structural stability and solubility characteristics during the lithography process
3Manufacturing precision
If acid diffusion is controlled by changing the anion structure of the acid generator to short acid diffusion length, then the acid diffusion control is improved, but the lithography properties require further optimization
Solution Approach 1:
The patent creates a composite system combining specifically structured acid generators (formula b0) with acid diffusion control agents (formula c0) and optimized polymeric compounds, where each component contributes specific functions that together achieve both precise acid diffusion control and excellent overall lithography properties
Solution Approach 2:
The patent applies local quality optimization by designing different molecular structures for different functional components: the polymeric compound provides the base matrix, the acid generator provides controlled acid generation, and the acid diffusion control agent provides localized acid diffusion control, with each having optimized local structural characteristics
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves good control of acid diffusion and excellent lithography properties, enhancing the formation of resist patterns with improved resolution and reduced LWR.
Implementation Method 1
an acid generator (B) which generates acid upon exposure
Data Source
AI summary
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).