Resist Composition Acid Diffusion Control for Fine Patterns
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Solution Overview
Problem
Current resist compositions face challenges in achieving high sensitivity and reduced roughness for forming fine resist patterns, particularly in electron beam and extreme ultraviolet lithography, where acid diffusion control and interaction between the base resin and acid generator need improvement.
Innovation Solution
A resist composition is developed that includes a base component with a structural unit capable of changing solubility in a developing solution under acid action and an acid generator component, specifically designed to control acid diffusion and enhance interaction, comprising compounds that generate acid upon exposure, thereby improving lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional resist compositions are used for fine pattern formation, then sensitivity to exposure source is improved, but roughness of resist pattern increases
Solution Approach 1:
The patent applies local quality by designing the base resin with specific functional groups (carboxyl, hydroxyl, or amine groups) at particular positions in the molecular structure. These functional groups are strategically placed to interact with the acid generator only in exposed regions, creating local chemical environment differences that control acid diffusion locally while maintaining overall pattern fidelity and reducing roughness
Solution Approach 2:
The patent uses composite materials by combining the specially designed base resin containing functional groups with specific acid generators. This composite resist composition creates enhanced interaction between components in exposed regions, improving sensitivity while the functional groups simultaneously control acid diffusion to reduce pattern roughness, resolving the contradiction between sensitivity and roughness
2Length of moving object
If acid diffusion is controlled by changing anion structure, then diffusion length is reduced, but interaction between base resin and acid generator is insufficient
Solution Approach 1:
The patent introduces functional groups (carboxyl, hydroxyl, or amine groups) as intermediary elements between the base resin and acid generator. These functional groups act as mediators that enhance the interaction strength through chemical bonding or strong intermolecular forces, while simultaneously serving as diffusion barriers to control acid diffusion length, thus resolving the contradiction between reduced diffusion and sufficient interaction
Solution Approach 2:
The patent applies parameter changes by modifying the chemical structure of the base resin to include specific functional groups with particular pKa values and bonding characteristics. This structural parameter change enhances the interaction parameter with acid generators while the functional groups also control the diffusion parameter through their chemical properties, achieving both reduced diffusion length and enhanced interaction
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves excellent lithography properties with improved sensitivity and reduced roughness, enabling the formation of fine resist patterns by effectively controlling acid diffusion and interaction, leading to enhanced resolution and development contrast.
Implementation Method 1
a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid
Data Source
AI summary
A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M′m+ represents an m-valent onium cation.