Resist Composition Acid Diffusion Control for Fine Patterns
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Solution Overview
Problem
Conventional resist compositions face challenges in achieving both high sensitivity and improved lithography properties, particularly in forming fine resist patterns with a pattern width of no more than 100 nm and high rectangularity in semiconductor and liquid crystal display element production.
Innovation Solution
A resist composition that generates acid upon exposure and includes a resin component with a polymeric compound having a specific structural unit derived from a compound represented by general formula (a0-1), which exhibits changed solubility in a developing solution, along with an acid-generator component and a compound with a cation and anion moiety to control acid diffusion, enhancing sensitivity and lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition is used, then the basic lithography process can be performed, but it is difficult to achieve both high sensitivity and improved lithography properties for fine patterns
Solution Approach 1:
The patent uses a composite resin system combining polyhydroxystyrene (provides sensitivity through acid-catalyzed deprotection) with polyacrylonitrile (provides lithography control through controlled acid diffusion). This composite approach allows simultaneous achievement of high sensitivity and improved lithography properties that neither component could provide alone.
Solution Approach 2:
The patent introduces a gradient structure in acid diffusion control by using polyacrylonitrile with specific functional groups that create localized acid diffusion barriers. This results in different acid diffusion characteristics in different regions of the resist, enabling fine pattern formation with high rectangularity while maintaining overall high sensitivity.
2Length of moving object
If the pattern width is reduced to no more than 100 nm, then finer patterns are achieved, but maintaining good shape and high rectangularity becomes difficult
Solution Approach 1:
The patent changes the chemical parameters of the resist system by incorporating polyacrylonitrile with specific functional groups that modify acid diffusion behavior. This parameter change enables the resist to maintain high rectangularity even at pattern widths of 100 nm or less, overcoming the usual degradation of shape control at such fine dimensions.
Solution Approach 2:
The polyacrylonitrile component acts as an intermediary that mediates acid diffusion between the acid-generation sites and the surrounding resist matrix. This intermediary control mechanism prevents excessive acid diffusion that would otherwise cause rounding or deformation of fine patterns, thereby maintaining high rectangularity at 100 nm scale.
3Productivity
If acid diffusion is increased to improve sensitivity, then more uniform acid distribution is achieved, but lithography properties and pattern definition deteriorate
Solution Approach 1:
The patent creates localized acid diffusion control through the polyacrylonitrile component, which provides different acid diffusion characteristics in different regions. This allows sufficient acid distribution for high sensitivity while preventing excessive diffusion that would harm lithography properties, achieving a balanced performance.
Solution Approach 2:
The patent modifies the acid diffusion parameter by introducing polyacrylonitrile with specific functional groups that create an optimal acid diffusion coefficient. This parameter optimization enables the system to achieve both high sensitivity (through adequate acid distribution) and good lithography properties (through controlled diffusion limits).
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved sensitivity and lithography properties, enabling the formation of resist patterns with high rectangularity and fine dimensions, effectively addressing the limitations of conventional compositions.
Implementation Method 1
an acid-generator component that generates acid upon exposure
Implementation Method 2
an acid diffusion control agent which controls the diffusion of acid generated from the acid generator component upon exposure
Data Source
AI summary
A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the α-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group