Resist Composition Acid Generator for Better CD Uniformity
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Solution Overview
Problem
Existing resist compositions fail to achieve satisfactory CD Uniformity (CDU) in resist patterns.
Innovation Solution
A novel salt represented by formula (I) is used as an acid generator in a resist composition, combined with a resin having acid-labile groups, to form a resist pattern through application, drying, exposure, and heating steps, resulting in improved CD Uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional salts are used as acid generators in resist compositions, then the resist composition can be manufactured with standard materials, but the CD Uniformity of the resist pattern is insufficient
Solution Approach 1:
The patent modifies the chemical structure of the salt by changing parameters such as the type of cation (introducing specific aromatic rings with substituents), the nature of the anion (using specific carboxylic acid or sulfonic acid derivatives), and molecular weight. These parameter changes in the salt's chemical composition directly improve the acid generation characteristics, leading to better CD uniformity and pattern quality while maintaining manufacturability with standard materials.
Solution Approach 2:
The patent employs composite material design by combining specific cations with specific anions to create a salt compound with optimized properties. The cation portion includes aromatic rings with specific substituents (halogen atoms, alkyl groups) while the anion portion includes carboxylic acid or sulfonic acid derivatives. This composite approach allows tuning of the salt's acid generation behavior to achieve superior CD uniformity while keeping the material compatible with existing manufacturing processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist pattern produced exhibits enhanced CD Uniformity, addressing the limitations of previous compositions.
Implementation Method 1
a salt represented by formula (I)... an acid generator... AI− represents an organic anion
Data Source
AI summary
Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI− represents an organic anion.