Resist Composition Acid Generator Molar Volume Optimization
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Solution Overview
Problem
Conventional resist compositions struggle to achieve high sensitivity and resolution, especially when forming fine patterns with narrow pitches, as the exposure light may not reach deep areas, resulting in insufficient photon density and difficulty in achieving both high sensitivity and lithography characteristics.
Innovation Solution
A resist composition that includes a base material component and an acid generator component, where the acid generator contains a first and second acid generator. The second acid generator has a cation moiety and an anion moiety with a molar volume of 250 cm3/mol or less, enhancing the generation of acid upon exposure and improving solubility changes in developing solutions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used for forming fine patterns with narrow pitch, then the exposure light source cannot reach deep part of the resist composition, but high sensitivity and resolution are required
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by selecting compounds with specific molar volumes (250 cm³/mol or less) and molecular weights (350 g/mol or less). This parameter optimization enables deeper light penetration and improved acid generation efficiency in the deep regions of the resist film, thereby achieving high resolution in fine pattern formation without sacrificing sensitivity
Solution Approach 2:
The patent employs a composite acid generator system combining specific onium salts (triphenylsulfonium or triphenyliodonium cations with fluorinated alkyl sulfonate anions) and other acid generators with controlled molar volumes. This composite approach synergistically improves both the sensitivity and resolution by ensuring adequate acid generation throughout the entire resist film depth
2Reliability
If conventional acid generator is used, then sensitivity is insufficient, but lithography characteristics cannot be compromised
Solution Approach 1:
The patent optimizes critical parameters of the acid generator including molar volume (≤250 cm³/mol) and molecular weight (≤350 g/mol). These parameter changes enhance the acid generation efficiency and sensitivity while maintaining appropriate acid diffusion characteristics, thus improving both sensitivity and lithography characteristics simultaneously
Solution Approach 2:
The patent introduces local quality differentiation by specifying distinct structural requirements for different components: onium salts with fluorinated alkyl sulfonate anions for enhanced sensitivity, and other acid generators with controlled molar volumes for optimized lithography characteristics. This localized optimization of component properties achieves both high sensitivity and excellent lithography performance
3Manufacturing precision
If fine pattern with narrow pitch is formed, then exposure light cannot reach deep part of resist, but good resolution and roughness reduction are required
Solution Approach 1:
The patent changes the physical parameters of the acid generator (molar volume ≤250 cm³/mol, molecular weight ≤350 g/mol) to reduce steric hindrance and improve mobility. This enables the acid to reach deep regions of the resist film more effectively during the post-exposure bake process, ensuring uniform solubility modification throughout the film depth and achieving both good resolution and roughness reduction in fine patterns
Solution Approach 2:
The patent employs acid generators that can be activated by exposure light to generate acid in advance during the exposure step. This preliminary acid generation occurs before the development process, ensuring that even deep regions of the resist film receive sufficient acid to modify solubility, thereby enabling good resolution and roughness control in narrow pitch patterns
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves higher sensitivity and better resolution with reduced roughness, enabling the formation of fine patterns with improved lithography characteristics.
Implementation Method 1
a chemical amplification-type resist composition which contains a base material component exhibiting changed solubility in a developing solution under action of acid, and an acid generator component which generates an acid upon exposure
Data Source
AI summary
A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm3/mol or less, and the molar volume of the anion moiety of the compound (B2) is smaller than the molar volume of the anion moiety of the compound (B1). In the formula, Rb0 represents a specific condensed cyclic group, Yb0 represents a divalent linking group, Vb0 represents a single bond, Rc1 represents an aryl group having an electron-withdrawing group, Rc2 and Rc3 each independently represent an aryl group or are bonded to each other to form a ring together with a sulfur atom in the formula.