Resist Composition Acid Generator for Lithography Pattern Quality
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Solution Overview
Problem
Current chemically amplified resist compositions with onium salt acid generators, particularly those using perfluoroalkylsulfonate ions, fail to adequately improve resist pattern shape roughness, mask reproducibility, exposure margin, and rectangularity, necessitating a more effective acid generator for advanced lithography demands.
Innovation Solution
A resist composition incorporating an acid generator compound represented by a specific general formula, which generates acid upon exposure, enhancing the solubility of the base component in an alkali developing solution to form a resist pattern with improved lithography properties such as roughness, mask reproducibility, and rectangularity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional onium salt acid generators with perfluoroalkylsulfonate ions are used, then the resist composition can maintain basic lithography functionality, but the resist pattern shape roughness, mask reproducibility, exposure margin, and rectangularity are insufficient
Solution Approach 1:
The patent modifies the chemical structure parameters of the acid generator by introducing a specific onium salt compound with a defined molecular structure (formula 1) where R1-R6 represent specific organic groups. This structural parameter change enhances the acid generation efficiency and improves resist pattern quality including roughness, mask reproducibility, exposure margin, and rectangularity while maintaining lithography functionality
Solution Approach 2:
The patent creates a composite acid generator system by combining the onium salt cation (Q+) with specific anion structures (formula 2) where n represents 1-3 and R7-R8 are specific organic groups. This composite structure optimizes both the acid generation capability and the solubility characteristics in developing solutions, achieving superior resist pattern formation with improved manufacturing precision
2Measurement precision
If the wavelength of exposure light source is shortened to achieve pattern miniaturization, then higher resolution is achieved, but the energy level increases requiring more sensitive resist materials
Solution Approach 1:
The patent changes the chemical composition parameters of the acid generator to optimize sensitivity to higher energy exposure light. The specific onium salt structure with adjustable organic groups (R1-R6) allows tuning of the absorption characteristics and acid generation efficiency, enabling the resist to respond effectively to shortened wavelength exposure while maintaining pattern resolution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed resist composition and method enable the formation of resist patterns with superior lithography properties, including enhanced roughness, mask reproducibility, and exposure margin, achieving a high degree of rectangularity and improved pattern quality.
Implementation Method 1
an acid generator that generates acid upon exposure
Data Source
AI summary
A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).