Resist Composition Acid Generator for Higher Pattern Collapse Margin
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Solution Overview
Problem
Existing resist compositions fail to provide sufficient pattern collapse margin (PCM) for resist patterns, leading to structural instability during processing.
Innovation Solution
A novel salt represented by formula (I) is used as an acid generator in a resist composition, which includes specific hydrocarbon groups and acid-labile moieties, combined with a resin having acid-labile groups, to enhance pattern stability during exposure and development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional salts are used as acid generators in resist compositions, then the resist composition can be manufactured with standard materials, but the pattern collapse margin (PCM) is insufficient leading to structural instability
Solution Approach 1:
The patent modifies the chemical structure of the salt by changing parameters such as the hydrocarbon group structure (formula I), substituent types (R1-R9, A1-A3), and molecular weight ranges. These parameter changes optimize the acid generation characteristics to improve pattern collapse margin while maintaining manufacturability through systematic structural modification rather than requiring entirely new material classes.
Solution Approach 2:
The invention creates a composite acid generator system by combining the specially structured salt (formula I) with specific resin compounds containing acid-labile groups. This composite approach allows the salt to generate acid that selectively reacts with the resin's acid-labile groups, achieving improved pattern stability while using well-understood material combinations that remain manufacturable.
2Stability of the object's composition
If the salt structure is optimized to improve pattern stability, then pattern collapse margin improves, but the complexity of the salt structure increases
Solution Approach 1:
The patent applies local quality by introducing specific functional groups (acid-labile groups at positions R10, A1-A3) and hydrocarbon substituents (R1-R9, A1-A3) at particular locations within the salt molecule. This localized modification approach allows targeted optimization of acid generation properties without requiring complete redesign of the entire molecular structure, thus improving pattern stability while controlling overall structural complexity.
Solution Approach 2:
The invention systematically varies parameters such as the number of carbon atoms in hydrocarbon groups (1-18), types of substituents (halogen, hydrocarbon, hydroxy), and molecular weight ranges. This parameter optimization approach allows gradual improvement of pattern stability through controlled structural adjustments rather than abrupt complex redesigns.
3Reliability
If existing salt compounds are used, then material availability is good, but the resist pattern lacks structural stability during processing
Solution Approach 1:
The patent optimizes material availability by defining specific ranges for molecular weight (100-500 Da) and structural parameters (number of carbon atoms, substituent types) that balance synthesis feasibility with performance requirements. These parameter constraints ensure that while the salt structure is optimized for structural stability, it remains within the capability of existing chemical manufacturing processes and material supply chains.
Solution Approach 2:
The invention creates a composite system combining the optimized salt with resin compounds containing acid-labile groups. This composite approach allows the salt to leverage the stability properties of well-known chemical structures while the resin component provides the necessary reactivity for pattern formation, achieving structural stability without requiring entirely new materials.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition with the novel salt achieves improved pattern collapse margin, ensuring robustness and stability of resist patterns during processing.
Implementation Method 1
a salt represented by formula (I)... which includes specific hydrocarbon groups and acid-labile moieties, combined with a resin having acid-labile groups
Data Source
AI summary
Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O-L10-CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4 to R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, etc.; and Al− represents an organic anion.