Resist Composition Acid Generator for Pattern Roughness
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Solution Overview
Problem
Conventional resist compositions containing onium salt acid generators face challenges in achieving high sensitivity and forming favorable resist patterns, especially when exposed to electron beam or extreme ultraviolet radiation, due to difficulties in obtaining desired shape and low roughness.
Innovation Solution
A resist composition that generates acid upon exposure, featuring a resin component with specific structural units and a compound with an anion and cation moiety, enhancing solubility changes in developing solutions to form high-sensitivity resist patterns with reduced roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional onium salt acid generators are used in resist composition, then the resist material can undergo chemically amplified solubility change upon exposure, but the sensitivity is insufficient and the resist pattern shape and roughness are not favorable
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by replacing conventional onium salt acid generators with fluorinated sulfonic acid generators. This parameter change results in enhanced sensitivity and improved resist pattern quality with reduced roughness, while maintaining the chemically amplified solubility change mechanism upon exposure
Solution Approach 2:
The patent employs a composite resist composition comprising fluorinated sulfonic acid generator, specific resin components (polymerizable group-containing compound and carboxylic acid group-containing compound), and solvent. This composite material system achieves both high sensitivity and favorable resist pattern shape with reduced roughness
2Length of moving object
If the wavelength of exposure light source is shortened to achieve pattern miniaturization, then higher energy exposure is possible, but the required sensitivity and resolution become more difficult to achieve
Solution Approach 1:
The patent changes the energy transfer parameters by using fluorinated sulfonic acid generators that efficiently convert exposure energy (including short wavelength EUV) into acid generation. This enables high sensitivity and fine resolution even when using short wavelength exposure sources for pattern miniaturization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high sensitivity and forms resist patterns with favorable shape and reduced roughness, improving lithography properties for advanced semiconductor and liquid crystal display element production.
Implementation Method 1
an acid-generator component that generates an acid upon exposure
Data Source
AI summary
A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, the entire anion moiety may be an n-valent anion, and Mm+ represents an m-valent organic cation