Resist Composition Acid Generator Mixed Solvent
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Solution Overview
Problem
Current resist compositions used in semiconductor manufacturing fail to achieve satisfactory critical dimension (CD) uniformity and shape consistency in resist patterns, leading to variations in the dimensions of semiconductor device features.
Innovation Solution
A resist composition is developed that includes a specific acid generator and a mixed solvent system, where the acid generator component contains a compound that generates acid upon light exposure, changing the solubility of the base material component in the developing solution, thereby improving solubility and pattern fidelity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition is used, then the basic lithography process can be performed, but the critical dimension uniformity and shape consistency of resist patterns are insufficient
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific acid generator (compound with sultone ring) and controlling the ratio of base material components (carboxylic acid group-containing component at 1-50 mass%). This modifies the solubility characteristics and acid-base neutralization behavior to achieve uniform critical dimensions and consistent pattern shapes
Solution Approach 2:
The patent creates a composite resist system combining multiple components: base material components (polymer and carboxylic acid group-containing component), acid generator (sultone ring compound), and solvent. The synergistic interaction between these composite materials, particularly the acid-base neutralization between the carboxylic acid group-containing component and the generated base, improves both CD uniformity and pattern shape consistency
2Manufacturing precision
If the solubility of the base material component is increased, then the developing performance is improved, but the pattern shape consistency deteriorates
Solution Approach 1:
The patent optimizes the solubility parameter by controlling the carboxylic acid group-containing component content at 1-50 mass% and selecting specific solvents (cyclic carboxylate, cyclic carbonate, or chain carboxylate). This balanced solubility improvement maintains pattern shape consistency through controlled acid-base neutralization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved solubility, reduced variation in critical dimensions, and enhanced shape consistency of resist patterns, enabling more precise semiconductor device manufacturing.
Implementation Method 1
an acid generator component (B) which generates an acid upon light exposure
Data Source
AI summary
A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rb1 represents an aryl group. Rb2 and Rb3 each independently represent an aliphatic hydrocarbon group. Lb1, Lb2, and Lb3 each independently represent a divalent linking group or a single bond. X− represents a counter anion. R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms