Resist Pattern Coating Composition for Lithography
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Solution Overview
Problem
Conventional lithographic processes face pattern collapse issues due to Laplace force during development and rinsing, especially when forming fine patterns, leading to structural integrity problems in resist patterns.
Innovation Solution
A coating composition comprising specific compounds such as metal oxides, polyacids, hydrolyzable silanes, and their derivatives is applied to resist patterns, filling spaces and forming a polymer layer that differs in etching rates from the resist, allowing for reverse pattern formation through controlled dry etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If development liquid or rinsing liquid is used to form resist pattern, then resist pattern can be formed, but pattern collapse occurs due to surface tension and Laplace force
Solution Approach 1:
The coating composition is applied to the resist pattern before the collapse-causing liquids are introduced. This preliminary coating creates a protective layer that prevents the resist pattern from collapsing when development liquid or rinsing liquid is subsequently applied, thereby maintaining structural integrity while enabling pattern formation
Solution Approach 2:
The coating composition acts as an intermediary substance between the resist pattern and the development/rinsing liquids. This intermediate layer modifies the interaction between the liquids and the resist pattern, reducing the harmful effects of surface tension and Laplace force that would otherwise cause pattern collapse
2Manufacturing precision
If fine patterns are formed, then higher resolution is achieved, but pattern collapse becomes more severe due to increased Laplace force
Solution Approach 1:
The coating composition is applied in advance to fine resist patterns before they are subjected to development and rinsing processes. This preliminary protective coating is particularly crucial for fine patterns where Laplace force effects are magnified, preventing collapse while maintaining the high resolution achieved through fine pattern formation
Solution Approach 2:
The coating composition changes the physical parameters of the resist pattern surface, creating a modified structure that is more resistant to Laplace force. By altering the surface properties and adding a protective layer, the composition enables fine patterns to withstand the increased harmful forces that accompany high-resolution pattern formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents pattern collapse by filling the resist pattern spaces with a polymer layer, enabling the formation of fine patterns without structural integrity issues and allowing for the reversal of the pattern through selective dry etching, ensuring the pattern remains intact.
Implementation Method 1
a method for forming a pattern using an organic solvent of a novolak resin or a polyalkylsiloxane as a rinsing liquid or a subsequent coating liquid
Implementation Method 2
volatilizing the solvent in the material for a coating film in order to form a coating film covering the resist film on the substrate
Implementation Method 3
processing the substrate using the mask pattern has been disclosed... removing the uncrosslinked part... removing the resist by dry etching
Data Source
AI summary
The invention provides a composition for coating a resist pattern and reversing the pattern by utilizing a difference in etching rates. A composition for applying to a resist pattern includes a component (A) which is at least one compound selected from the group consisting of a metal oxide (a1), a polyacid (a2), a polyacid salt (a3), a hydrolyzable silane (a4), a hydrolysis product (a5) of the hydrolyzable silane, and a hydrolysis condensate (a6) of the hydrolyzable silane; and a component (B), which is an aqueous solvent, in which the hydrolyzable silane (a4) is (i) a hydrolyzable silane containing an organic group having an amino group, (ii) a hydrolyzable silane containing an organic group having an ionic functional group, (iii) a hydrolyzable silane containing an organic group having hydroxy group, or (iv) a hydrolyzable silane containing an organic group having a functional group convertible to hydroxy group.