Resist composition and method for forming resist pattern
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resist compositions face a trade-off between sensitivity and roughness reducing properties, making it difficult to achieve both high sensitivity and good pattern quality in semiconductor manufacturing.
Innovation Solution
A resist composition containing a base material component, an acid generator component, and a photodecomposable base that controls acid diffusion, utilizing specific compounds represented by General Formulas (d0-1) and (d0-2), which generates acid upon exposure and changes solubility in a developing solution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a photoreactive quencher component with sulfonic acid or carboxylic acid anion is used as an acid diffusion controlling agent, then roughness reducing property is improved, but sensitivity deteriorates
Solution Approach 1:
The patent changes the chemical parameters of the acid diffusion controlling agent by using phosphoric acid anion instead of sulfonic acid or carboxylic acid anion. This parameter change allows the system to achieve both good roughness reducing property and high sensitivity simultaneously, resolving the trade-off relationship between these two characteristics.
Solution Approach 2:
The patent creates a composite resist composition system that combines the photodecomposable base (D0) with specific compounds represented by General Formulas (d0-1) and (d0-2). This composite approach integrates multiple functional components that work together to achieve both high sensitivity and excellent roughness reducing properties, overcoming the limitations of single-component systems.
2Productivity
If higher sensitivity is pursued, then productivity is improved, but roughness reducing property deteriorates
Solution Approach 1:
The patent modifies the key parameter of the acid diffusion controlling agent from sulfonic acid/carboxylic acid anion to phosphoric acid anion. This parameter change enables the system to maintain high sensitivity for improved productivity while simultaneously achieving excellent roughness reducing property, thus resolving the inverse relationship between these parameters.
3Manufacturing precision
If pattern fining is achieved by shortening wavelength, then resolution is improved, but manufacturing complexity increases
Solution Approach 1:
The patent changes the chemical composition parameters of the resist material by incorporating the photodecomposable base (D0) with compounds of General Formulas (d0-1) and (d0-2). This compositional parameter change enables the resist to achieve fine pattern resolution without requiring extreme wavelength shortening, thereby reducing the complexity of the lithography system while maintaining high resolution capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves higher sensitivity with improved roughness reducing properties, enabling the formation of high-quality resist patterns through positive or negative-tone development processes.
Implementation Method 1
an acid generator component (B) that generates acid upon exposure
Implementation Method 2
a photodecomposable base (D0) that controls diffusion of the acid generated upon exposure from the acid generator component (B)
Implementation Method 3
a base material component (A) that exhibits changed solubility in a developing solution under action of acid
Data Source
AI summary
A resist composition comprising a base material component (A), an acid generator component (B), and a photodecomposable base (D0), in which the photodecomposable base (D0) contains a compound (D01) represented by General Formula (d0-1) and a compound (D02) represented by General Formula (d0-2), Rd01 represents a chain or cyclic aliphatic hydrocarbon group which may have a substituent, n01 represents an integer in a range of 1 to 10, Rd02 represents a cyclic aliphatic hydrocarbon group having an oxygen atom (═O), m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation