Chemically Amplified Resist Composition for Lithography
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Solution Overview
Problem
Conventional resist materials face challenges in achieving optimal lithography properties, particularly in miniaturization processes where the resin components' optimization is difficult based on varying lithography conditions, and there is a need for improved solubility changes in response to exposure.
Innovation Solution
A resist composition incorporating a polymeric compound with structural units that contain an acid decomposable group and an acid generating group, allowing for changed solubility in developing solutions upon exposure, enabling the formation of fine resist patterns with excellent lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resin composition is used in chemically amplified resist, then the resist material can achieve basic lithography functionality, but it becomes difficult to optimize lithography properties for miniaturization processes and achieve optimal solubility changes in response to exposure
Solution Approach 1:
The patent changes the chemical parameters of the resin by introducing specific structural units: (a1) carboxylic acid groups that increase polarity and solubility in alkali developing solutions, (a2) hydroxyl groups that enhance solubility, and (a6) acid-generating groups that provide acid upon exposure. By controlling the molar ratios of these structural units (a1: 0.1-10 mol%, a2: 0.1-10 mol%, a6: 1-50 mol%), the resist composition achieves optimized solubility changes and lithography properties for miniaturization processes
Solution Approach 2:
The patent creates a composite resin structure by combining multiple structural units within the same polymer chain: the base structural unit (a0) providing the resin backbone, combined with functional units (a1) carboxylic acid groups, (a2) hydroxyl groups, and (a6) acid-generating groups. This composite approach allows the single resin component to simultaneously provide structural integrity, solubility control, and acid-generation functionality, achieving both improved lithography properties and adaptability to varying lithography conditions
2Manufacturing precision
If the resist material uses a resin with increased polarity by acid action, then solubility in alkali developing solution increases for positive-tone patterns, but solubility in organic developing solution decreases making it unsuitable for negative-tone patterns
Solution Approach 1:
The patent makes the resin component universal by incorporating multiple functional structural units that provide different solubility characteristics: carboxylic acid groups (a1) for alkali developing solution solubility enhancement, hydroxyl groups (a2) for organic developing solution solubility enhancement, and acid-generating groups (a6) for photo-reactivity. This multi-functional design allows the same resist composition to be used with both alkali and organic developing solutions, enabling flexibility in choosing between positive-tone and negative-tone pattern formation depending on the developing process selected
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively forms positive or negative tone patterns by altering solubility in response to exposure, improving pattern resolution and uniformity, and adapting to different developing processes.
Implementation Method 1
a chemically amplified resist composition, which includes an acid-generator component that generates acid upon exposure and a base material component that exhibits a changed solubility in a developing solution under the action of acid
Implementation Method 2
the base material component that exhibits a changed solubility in a developing solution under the action of acid
Data Source
AI summary
A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; W represents —COO—, —CONH— or a divalent aromatic hydrocarbon group; Y1 and Y2 represents a divalent linking group or a single bond; R′1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).