Resist Composition Acid Generation Pattern Stability

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Solution Overview

Problem

In the miniaturization of resist patterns, chemically amplified resist compositions face challenges with decreased resolution and roughness due to low optical intensity regions in exposed resist films, particularly in film thickness direction, and degraded sensitivity and hydrophilicity from crosslinking agents and low reactivity of crosslinking groups.

Innovation Solution

A resist composition is developed that includes a polymer compound with specific constitutional units derived from compounds represented by Formulas (a0-1) and (a10-1), which generates acid upon exposure, changing solubility in developers, and does not contain a constitutional unit represented by Formula (1), thereby improving sensitivity, resolution, and roughness by controlling crosslinking and hydrophilicity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If crosslinking agent component is added to improve pattern stability, then reliability is improved, but sensitivity and hydrophilicity are degraded

Engineering Contradiction:

Improvepattern stabilityVSAvoiddegraded sensitivity and hydrophilicity

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent extracts the harmful crosslinking agent component from the resist composition. By removing the crosslinking agent and using a polymer compound with inherent crosslinkable groups instead, the composition avoids the sensitivity and hydrophilicity degradation caused by traditional crosslinking agents while maintaining pattern stability through controlled crosslinking of the polymer structure.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent uses a composite polymer compound containing both crosslinkable groups (for pattern stability) and hydrophilic groups (for sensitivity and developer solubility). This composite structure integrates multiple functions within a single material, eliminating the need for separate crosslinking agents that degrade performance.

Inventive Principle:

Principle #40Composite materials

2Manufacturing precision

If chemically amplified resist composition is used to achieve fine pattern reproduction, then manufacturing precision is improved, but resolution and roughness are decreased due to low optical intensity regions

Engineering Contradiction:

Improvepattern reproduction capabilityVSAvoidresolution and roughness

Core Design Contradiction:

Manufacturing precisionVSMeasurement precision

Solution Approach 1:

The patent changes the chemical parameters of the resist composition by incorporating a polymer compound with specific functional groups that enhance acid generation efficiency and distribute it more uniformly. This improves the chemical amplification process, reducing low optical intensity regions and improving resolution while maintaining manufacturing precision.

Inventive Principle:

Principle #35Parameter changes

3Reliability

If polymer compound with crosslinking groups is used to improve pattern stability, then reliability is improved, but sensitivity and hydrophilicity are degraded

Engineering Contradiction:

Improvepattern stabilityVSAvoiddegraded sensitivity and hydrophilicity

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent applies local quality by placing different functional groups in specific locations within the polymer structure. Crosslinkable groups are positioned to provide stability where needed, while hydrophilic groups are distributed to maintain sensitivity and developer interaction. This spatial differentiation allows both properties to coexist without mutual degradation.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resist composition enhances sensitivity, resolution, and roughness of resist patterns by effectively managing crosslinking and hydrophilicity, leading to improved lithography performance and pattern formation.

Implementation Method 1

an acid generator component that generates an acid when exposed

Methodology Applied

Scientific EffectPhotoacid generation: Photopolymerisation

Implementation Method 2

crosslinking occurs between the crosslinking agent component and the alkali-soluble base material component due to an action of an acid

Methodology Applied

Scientific EffectAcid-catalyzed crosslinking: Chemical Bonding

Data Source

PatentUS10976661B2Resist composition, method of forming resist pattern, and polymer compound

Publication Date: 2021.04.13 TOKYO OHKA KOGYO CO LTD

AI summary

A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including a polymer compound (A1) which has a constitutional unit (a0) derived from a compound represented by Formula (a0-1) and a constitutional unit (a10) derived from a compound represented by Formula (a10-1) and does not have a constitutional unit represented by Formula (1). In the formulas, Rax0 and Rax1 represent a polymerizable group-containing group; Wax0 and Wax1 represent an (nax0+1)-valent or (nax1+1)-valent aromatic hydrocarbon group; nax0 and nax1 represent an integer of 1 to 3; and Z2 represents Fe, Co, Ni, Cr, or Ru.