Resist Composition with Fluorinated Resin and Acid Generator
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Solution Overview
Problem
Conventional resist compositions often fail to achieve satisfactory focus margin and are prone to defects during the production of resist patterns.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, which is insoluble in alkali aqueous solutions but becomes soluble upon acid action, along with a solvent, applied to a substrate, dried, exposed, heated, and developed to form a resist pattern with improved focus margin and reduced defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition is used, then the resist pattern can be produced, but the focus margin is not satisfied and the number of defects increases
Solution Approach 1:
The patent changes the chemical composition parameters of the resist system by introducing a specific base compound (formula I) with fluorinated alkyl groups and combining it with a specific acid generator (formula II). This parameter change in the chemical formulation leads to improved focus margin and reduced defects in the resist pattern.
Solution Approach 2:
The patent creates a composite resist system by combining the base compound (formula I) with the acid generator (formula II) and other resist components. This composite material approach, where the specific interaction between the base compound and acid generator generates acid in situ, achieves both improved focus margin and reduced defects simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves a resist pattern with enhanced focus margin and fewer defects, as the resin's structural units and acid generator combination ensures solubility and patterning accuracy.
Implementation Method 1
an acid generator represented by the formula (II)... becoming soluble in an alkali aqueous solution by the action of an acid
Data Source
AI summary
A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II),wherein R1, A1, R2, Q1, Q2, L1, ring W1, and Z+ are defined in the specification.