Resist Composition Acid Generator Formula b0 CDU Resolution
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Solution Overview
Problem
Existing resist compositions for semiconductor and liquid crystal display element manufacturing lack sufficient in-plane uniformity (CDU) and resolution, necessitating the development of a new resist composition that can achieve both higher CDU and resolution.
Innovation Solution
A resist composition that generates an acid upon light exposure, comprising a base material component whose solubility in a developing solution is changed by an acid action, and an acid generator component containing a specific compound represented by General Formula (b0).
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but in-plane uniformity (CDU) and resolution are insufficient
Solution Approach 1:
The patent changes the chemical structure parameters of the acid generator component by introducing a specific compound type (Formula b0) with defined molecular characteristics (Rpg, Rl0, L02, L01, Rm1, Vb0, R0 groups and integers nb1, nb2, nb3). This structural parameter change enables the acid generator to produce acid with controlled diffusion properties, simultaneously improving in-plane uniformity (CDU) and resolution without complicating the overall manufacturing process
Solution Approach 2:
The patent creates a composite resist composition system by combining the base material component (A) with the specifically structured acid generator component (B0). This composite approach integrates the light-sensitive base material with the newly designed acid generator compound, achieving synergistic effects that improve both CDU and resolution while maintaining process simplicity
2Reliability
If acid diffusion is increased to improve sensitivity, then sensitivity improves, but in-plane uniformity (CDU) deteriorates
Solution Approach 1:
The patent applies local quality by designing the acid generator component (B0) with specific local molecular characteristics (Rpg acid decomposable group, Rl0 cyclic organic group, L02 divalent linking group, etc.) that control acid generation and diffusion locally within the resist film. This localized control enables the acid to diffuse sufficiently to maintain sensitivity while preventing excessive diffusion that would harm CDU, achieving both requirements simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves satisfactory in-plane uniformity (CDU) and resolution, enhancing the formation of fine patterns in semiconductor and liquid crystal display element manufacturing.
Implementation Method 1
an acid generator component (B) which generates an acid upon light exposure, in which the acid generator component (B) contains a compound (B0) represented by General Formula (b0)
Implementation Method 2
a base material component (A) whose solubility in a developing solution is changed by an action of an acid
Data Source
AI summary
A resist composition including a base material component and a compound represented by General Formula (b0), in which Rpg represents an acid decomposable group, Rl0 represents a cyclic organic group which may have a substituent, L02 represents a divalent linking group, L01 represents a divalent linking group or a single bond, Rm1 represents a substituent other than an iodine atom, Vb0 represents a single bond, R0 represents a hydrogen atom, nb1 represents an integer of 1 to 4, nb2 represents an integer of 1 to 4, nb3 represents an integer of 0 to 3, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or greater