Resist Composition for Critical Dimension Uniformity
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Solution Overview
Problem
Conventional resist compositions with specific polymer structures fail to achieve satisfactory critical dimension uniformity (CDU) in resist patterns.
Innovation Solution
A resist composition comprising a resin with a structural unit represented by formula (I) that is insoluble in alkali aqueous solutions but becomes soluble upon acid action, combined with an acid generator represented by formula (II) and optionally formula (III), and including a solvent and basic compounds, applied in a method involving application, drying, exposure, and development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition containing specific polymer structures is used, then the resist composition can be manufactured with standard materials, but the critical dimension uniformity (CDU) of the obtained resist pattern is not satisfied
Solution Approach 1:
The patent changes the chemical structure parameters of the resin by introducing specific structural units (formula I) with particular functional groups and molecular weight ranges, thereby improving CDU while maintaining manufacturing feasibility
Solution Approach 2:
The patent uses a composite resin system combining multiple polymer components with different structural units (formula I, II, III) to achieve both good CDU and etch resistance, resolving the contradiction between precision and reliability
2Ease of operation
If the resin is made soluble in alkali aqueous solution for easy development, then the development process becomes simpler, but the resist pattern uniformity and resolution deteriorate
Solution Approach 1:
The patent applies acid exposure as a preliminary action that modifies the resin structure before development, creating acid-soluble sites that enable controlled dissolution while maintaining pattern uniformity through the specific structural unit design
Solution Approach 2:
The patent changes the solubility parameter of the resin dynamically - the resin remains insoluble in alkali during storage and processing, then becomes soluble after acid exposure, achieving both ease of operation and high precision
3Manufacturing precision
If the resin is made insoluble in alkali aqueous solution to improve resolution, then the resist pattern resolution improves, but the development process becomes more complex
Solution Approach 1:
The patent introduces acid as an intermediary substance that mediates between the insoluble resin state and the soluble development state, enabling the resin to maintain high resolution while allowing straightforward development through acid-base chemistry
4Strength
If the resin contains specific structural units for good etch resistance, then the dry etching resistance improves, but the solubility control in alkali solutions becomes difficult
Solution Approach 1:
The patent applies local quality by introducing specific structural units (formula I) with particular functional groups at specific locations within the polymer chain, creating regions of high etch resistance while maintaining overall solubility control through the molecular weight and structural unit distribution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves resist pattern uniformity and resolution by ensuring the resin's solubility in alkali solutions only after acid exposure, enhancing the critical dimension uniformity and dry etching resistance.
Implementation Method 1
an acid generator represented by the formula (II)... wherein RII1 and RII2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II),wherein R1, A1, A13, A14, X12, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.