Resist Composition Acid Dissociable Unit for EUV Lithography
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Solution Overview
Problem
Current resist compositions face challenges in achieving high sensitivity and reduced roughness for forming fine resist patterns, particularly in electron beam and extreme ultraviolet lithography, where acid diffusion control is critical for improving lithography properties.
Innovation Solution
A resist composition is developed that includes a resin component with a specific structural unit (a0) which generates acid upon exposure, changing its solubility in a developing solution, allowing for improved development contrast and pattern formation through selective exposure and development processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If chemically amplified resists are used to improve sensitivity and resolution, then lithography properties are improved, but acid diffusion control becomes more difficult
Solution Approach 1:
The patent introduces a specific structural unit (a0) with an acid dissociable functional group that locally modifies the resin's chemical properties. This unit contains a cyclic hydrocarbon group that can be protonated by acid, creating a local chemical environment that controls acid diffusion and enhances lithography performance without requiring complex global modifications to the resist system
Solution Approach 2:
The patent modifies the chemical structure of the resin component by incorporating the specific structural unit (a0) with formula containing R0, Vax0, Wa, Vax1, and the cyclic hydrocarbon group. This parameter change in molecular structure enables improved acid diffusion control and lithography properties while maintaining relative simplicity in the resist composition
2Manufacturing precision
If the wavelength of exposure light source is shortened to achieve pattern miniaturization, then resolution is improved, but sensitivity to exposure source increases
Solution Approach 1:
The patent changes the chemical parameters of the resist material by incorporating the specific structural unit (a0) with the cyclic hydrocarbon group and acid dissociable functional group. This modification enhances the resin's sensitivity to acid generation during exposure, allowing effective operation at shorter wavelengths (EUV and EB) while maintaining high sensitivity to the exposure source for achieving fine pattern miniaturization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition enhances lithography properties by achieving better sensitivity and reduced roughness, enabling the formation of fine resist patterns with improved resolution and sensitivity to exposure sources.
Implementation Method 1
a resin component (A1) which exhibits changed solubility in a developing solution under action of acid, the resin component (A1) including a structural unit (a0)... provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya0
Implementation Method 2
exhibits changed solubility in a developing solution under action of acid
Data Source
AI summary
A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya0.