Resist Composition CD Uniformity via Alicyclic Resin Structure
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Solution Overview
Problem
Existing resist compositions fail to achieve satisfactory CD uniformity in resist patterns, which is crucial for precise microfabrication and patterning applications.
Innovation Solution
A compound represented by formula (I) is used to form a resin with specific structural units, which is incorporated into a resist composition. This composition includes a structural unit derived from the compound, along with other units such as acid-labile groups, to enhance CD uniformity during the resist pattern formation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing resist compositions are used, then the resist pattern formation process is simple, but the CD uniformity is insufficient
Solution Approach 1:
The patent modifies the chemical structure of the resin by introducing specific structural units with defined parameters (R1 as alkyl group with 1-6 carbon atoms, W as divalent monocyclic saturated alicyclic hydrocarbon group with 3-12 carbon atoms, and specific ring structures with R2-R4 substituents). These parameter changes in the molecular structure enable improved CD uniformity while maintaining manageable complexity through systematic structural design
Solution Approach 2:
The resin is designed as a composite material containing multiple structural units: the core structural unit from formula (I) with specific alicyclic hydrocarbon groups, additional structural units from formula (a2-A) containing phenolic hydroxy groups, and acid-labile structural units. This composite structure combines different functional components to achieve both high CD uniformity and controlled complexity
2Manufacturing precision
If resist composition with improved CD uniformity is achieved, then pattern precision is enhanced, but the composition complexity increases
Solution Approach 1:
The patent introduces specific local structural features within the resin molecules, including alicyclic hydrocarbon groups (cyclopentanediyl or cyclohexanediyl groups) at specific positions, and phenolic hydroxy groups at defined locations in the molecular structure. These localized structural modifications enhance pattern precision without requiring complete redesign of the entire composition system
Solution Approach 2:
The patent specifies precise parameter ranges for structural components: R1 as alkyl groups with 1-6 carbon atoms, W as alicyclic groups with 3-12 carbon atoms, and controlled numbers of structural units (content ratios). These parameter specifications enable optimization of pattern precision while managing composition complexity through defined structural parameters
Data Source
AI summary
Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition:wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A1 represents a single bond or *-A2-CO—O—; A2 and A3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R2 and R3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R4 represents a hydrogen atom, —CH2— in the group may be replaced by —O—, —S—, etc., R2 and R3, or R2, R3 and R4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.