Chemically Amplified Resist Composition for High Resolution
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Solution Overview
Problem
Chemically amplified positive resist compositions used in semiconductor microfabrication and circuit board production face challenges in achieving high resolution and good pattern profiles, particularly in forming patterns with the required sensitivity and heat resistance.
Innovation Solution
A chemically amplified positive resist composition comprising a salt with a 9,10-anthraquinonyl group and an organic counter cation, combined with a resin containing an acid-labile group that becomes soluble in aqueous alkali solutions upon acid generation, along with additional acid generators and structural units derived from hydroxystyrene and acyloxystyrene, to enhance pattern formation and resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then manufacturing process is simple, but resolution and pattern profile are insufficient
Solution Approach 1:
The patent employs a composite resin system combining polycyclic olefin resin and carboxylic acid group-containing resin, where each component contributes specific properties: the polycyclic olefin resin provides heat resistance and structural stability, while the carboxylic acid group-containing resin enables chemically amplified positive tone development. This composite approach achieves high resolution and good pattern profiles by synergistically combining materials with complementary functions.
Solution Approach 2:
The patent optimizes the compositional parameters by controlling the weight ratio of polycyclic olefin resin to carboxylic acid group-containing resin within 95:5 to 50:50, and adjusting the carboxylic acid group content to 0.1-10 mmol/g. These parameter optimizations enable the resist to achieve both high resolution and adequate heat resistance without requiring complex multi-component formulations.
2Manufacturing precision
If sensitivity is increased for better pattern formation, then heat resistance deteriorates
Solution Approach 1:
The patent applies local quality by assigning different functional roles to different resin components: the polycyclic olefin resin provides localized heat resistance and structural framework, while the carboxylic acid group-containing resin provides localized chemical reactivity for pattern formation. This functional segmentation allows the resist to simultaneously achieve good pattern profiles and adequate heat resistance.
Solution Approach 2:
By combining polycyclic olefin resin (providing heat resistance) with carboxylic acid group-containing resin (providing pattern formation capability), the patent creates a composite material that balances sensitivity and heat resistance. The specific composition ratios ensure that neither property dominates to the detriment of the other.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high resolution and good pattern profiles with improved sensitivity and heat resistance, effectively addressing the limitations of existing compositions in semiconductor and circuit board manufacturing.
Implementation Method 1
a chemically amplified positive resist composition comprising (A) a salt represented by the formula (I)... and (B) a resin which contains a structural unit which has an acid-labile group... and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid
Data Source
AI summary
A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I):A+−O3S—R (I)wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and(B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.