Resist Resin Composition for Narrow L/S Pattern Bridge Suppression
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions fail to prevent bridge defects in narrow space widths during the formation of line-and-space patterns, which are necessary for further miniaturization in semiconductor elements.
Innovation Solution
Incorporating a resin with an acid-decomposable group, a photoacid generator, and a boron-containing compound, along with an acid diffusion control agent, to enhance light absorption and electron transfer efficiency, thereby reducing the occurrence of bridge defects in narrow space widths.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional actinic ray-sensitive or radiation-sensitive resin compositions are used, then the pattern formation process can proceed with standard sensitivity, but bridge defects occur in narrow space widths preventing further miniaturization
Solution Approach 1:
The patent changes the chemical parameters of the resin composition by incorporating specific compounds: a resin with acid-decomposable groups (changing the base material properties), a photoacid generator (changing the sensitivity characteristics), and a boron-containing compound (changing the acid diffusion properties). These parameter changes collectively reduce the space width at which bridge defects occur, enabling finer pattern formation.
Solution Approach 2:
The patent creates a composite resist composition by combining multiple functional components: the resin (A) with acid-decomposable groups, the photoacid generator, and the boron-containing compound. This composite material approach allows each component to contribute its specific function, collectively solving the bridge defect problem while maintaining pattern formation capability.
2Length of moving object
If the space width is narrowed for miniaturization, then finer patterns can be formed, but bridge defects occur more frequently
Solution Approach 1:
The patent modifies the chemical parameters of the resist system to enable narrower space widths without bridge defects. The boron-containing compound specifically alters acid diffusion parameters, while the photoacid generator enhances sensitivity, allowing the system to maintain reliability at reduced space widths.
Solution Approach 2:
The patent replaces the reliance on purely physical/geometric parameters (space width) with chemical parameter control. By introducing compounds that chemically modify acid generation and diffusion, the system achieves pattern fidelity at narrower dimensions without relying solely on increased exposure energy or altered development mechanics.
3Measurement precision
If exposure sensitivity is increased for finer patterns, then resolution improves, but photon shot noise increases
Solution Approach 1:
The patent changes the sensitivity parameters of the photoacid generator to achieve higher resolution with reduced photon shot noise. By selecting a photoacid generator with appropriate quantum efficiency and absorption characteristics, the system achieves enhanced sensitivity that improves resolution without proportionally increasing noise.
Solution Approach 2:
The boron-containing compound acts as an intermediary that mediates between the photoacid generator and the resin. It enhances the efficiency of acid generation and diffusion control, allowing the system to achieve better resolution with lower exposure doses, thereby reducing photon shot noise while maintaining measurement precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves a narrower space width at which bridge defects occur, allowing for the formation of finer patterns with improved resolution and sensitivity, while minimizing photon shot noise.
Implementation Method 1
a photoacid generator included in portions to be exposed is decomposed by light irradiation to generate an acid
Implementation Method 2
an alkali-insoluble group of a resin included in an actinic ray-sensitive or radiation-sensitive resin composition is changed, by the catalytic action of the generated acid, to an alkali-soluble group to change the solubility in a developer
Data Source
AI summary
A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a narrow space width at which bridge defects start to occur when an L/S pattern is formed. A second object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin having a group that is decomposed by an action of an acid to generate a polar group, a photoacid generator, and a boron-containing compound and satisfies a requirement 1. Requirement 1: A value A determined by an equation (1) is 0.120 or more.