Resist Composition Structure for Improved CD Uniformity
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Solution Overview
Problem
Existing resist compositions fail to achieve satisfactory CD uniformity in resist patterns.
Innovation Solution
A resist composition comprising a resin with a specific structural unit represented by formula (IP) and optionally including acid-labile and/or base-labile groups, along with an acid generator and a quencher, is used to form resist patterns through application, drying, exposure, and heating steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the resist pattern formation process is simple, but the CD uniformity is poor
Solution Approach 1:
The patent uses a composite resin structure combining multiple functional groups (acrylic acid units with specific side chains, hydroxyethyl methacrylate units, and crosslinking units) to achieve both improved CD uniformity and satisfactory processability. The composite nature of the resin allows simultaneous optimization of different performance aspects.
Solution Approach 2:
The patent systematically varies chemical parameters of the resin structure, including the types of side chains (R1, R2, R3, R4), their lengths, and their arrangements, to optimize the balance between CD uniformity and other performance characteristics. This parameter optimization approach enables achieving target CD uniformity while maintaining practical manufacturability.
2Manufacturing precision
If resist composition with specific structural unit (IP) is used, then CD uniformity is improved, but the complexity of resin structure increases
Solution Approach 1:
The resin is synthesized through multi-step polymerization processes where different functional units (acrylic acid units with specific side chains, hydroxyethyl methacrylate units, crosslinking units) are introduced in separate steps. This segmentation of the synthesis process allows for controlled incorporation of each functional group, making the overall manufacturing feasible despite the complex final structure.
Solution Approach 2:
The patent employs intermediary compounds and step-growth polymerization mechanisms to build the complex resin structure. Intermediate polymers with specific functional groups are formed first, then combined through controlled reactions to create the final crosslinked network structure, simplifying the overall synthesis pathway.
3Manufacturing precision
If acid-labile and base-labile groups are included in the resin, then the resist pattern precision is improved, but the composition complexity increases
Solution Approach 1:
The patent introduces acid-labile groups (such as tert-butoxycarbonyl groups) and base-labile groups (such as triethylsilyl groups) at specific locations within the resin structure rather than uniformly throughout. This localized placement allows different regions of the resist film to have different solubility characteristics, enabling precise pattern formation while keeping the overall composition manageable.
Solution Approach 2:
The resin is designed with multiple labile groups that can be selectively removed under different conditions (acid treatment for acid-labile groups, base treatment for base-labile groups). This dynamic behavior allows the resin to transition through different solubility states during the patterning process, improving precision while the systematic approach to group selection keeps composition complexity controlled.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the fabrication of resist patterns with improved CD uniformity (CDU) by optimizing the resist pattern formation process.
Implementation Method 1
the acid generator contains a salt represented by formula (B1) or a salt represented by formula (B2)
Data Source
AI summary
A resin including a structural unit represented by formula (IP):wherein Rbb1 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, Ar1 represents an aromatic hydrocarbon group which may have a substituent, or a heterocyclic aromatic hydrocarbon group which may have a substituent, Ar2 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group, X1 represents *—CO—O—, *—O—CO—O— or *—O—, R2 represents a hydrocarbon group, R4 represents a halogen atom, or a hydrocarbon group which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, R5 represents a hydrogen atom, an acid-labile group or a base-labile group, m4 represents an integer of 0 to 4, and m5 represents an integer of 1 to 5.