Radiation-Sensitive Resist Composition for CDU and Defect Control

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Solution Overview

Problem

Existing photolithography techniques face challenges in achieving high sensitivity and critical dimension uniformity (CDU) while minimizing development defects in next-generation technologies using short-wavelength radiation.

Innovation Solution

A radiation-sensitive composition comprising a polymer with specific structural units and a solvent, incorporating a radiation-sensitive acid generator with a halogen-free onium cation and iodine-containing sulfonic acid anion, enhances sensitivity and controls acid diffusion for improved CDU and reduced development defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional photolithography techniques are used, then existing process compatibility is maintained, but sensitivity and critical dimension uniformity are insufficient for next-generation technologies

Engineering Contradiction:

Improvesensitivity and critical dimension uniformityVSAvoidpattern formation quality

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the chemical parameters of the acid generator by using a sulfonic acid anion containing an iodine atom combined with a halogen-free onium cation. This parameter change in the molecular structure enables enhanced sensitivity and improved critical dimension uniformity while maintaining compatibility with existing photolithography processes

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite acid generator structure by combining specific onium cations (with halogen-free electron withdrawing groups) and sulfonic acid anions (containing iodine atoms). This composite approach leverages the synergistic effects of both components to achieve superior sensitivity and pattern formation quality

Inventive Principle:

Principle #40Composite materials

2Power

If halogen-containing onium cations are used, then acid generation efficiency is improved, but development defects increase

Engineering Contradiction:

Improveacid generation efficiencyVSAvoiddevelopment defects

Core Design Contradiction:

PowerVSObject-generated harmful factors

Solution Approach 1:

The patent converts the potential harm of halogen atoms (which cause development defects) into a benefit by replacing them with halogen-free electron withdrawing groups. These alternative groups maintain the necessary electron-withdrawing capability for efficient acid generation while eliminating the harmful effects on development quality

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The invention applies local quality by introducing electron-withdrawing groups at specific positions on the onium cation structure. This localized modification optimizes acid generation efficiency at the molecular level while preventing the propagation of harmful effects throughout the material

Inventive Principle:

Principle #3Local quality

3Reliability

If acid diffusion is increased to improve sensitivity, then more acid is generated, but critical dimension uniformity deteriorates

Engineering Contradiction:

ImprovesensitivityVSAvoidcritical dimension uniformity

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the physical-chemical parameters of the acid generator by incorporating iodine atoms in the sulfonic acid anion. The iodine atom's specific properties modify the acid diffusion characteristics, enabling sufficient sensitivity while maintaining control over diffusion extent to preserve critical dimension uniformity

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high sensitivity and uniformity in resist film formation, suppressing development defects and enabling efficient production of high-quality resist patterns.

Implementation Method 1

a radiation-sensitive acid generator (B) including a first organic acid anion and a first onium cation

Methodology Applied

Scientific EffectPhotodissociation: Photodissociation

Implementation Method 2

the first organic acid anion is a sulfonic acid anion including an iodine atom

Methodology Applied

Scientific EffectPhotoionization: Photoionisation

Data Source

PatentUS20260104642A1Radiation-sensitive composition, method for forming pattern, and radiation-sensitive acid generator

Publication Date: 2026.04.16 JSR CORPORATION

AI summary

A radiation-sensitive composition includes: a polymer (A) including a structural unit (I) which includes an acid-dissociable group; and a solvent (C). The radiation-sensitive composition satisfies (i) and/or (ii). (i) The radiation-sensitive composition includes a radiation-sensitive acid generator (B) including a first organic acid anion and a first onium cation. The first onium cation is an onium cation including a halogen-free electron withdrawing group containing no halogen atom, and the first organic acid anion is a sulfonic acid anion including an iodine atom. (ii) The polymer (A) is a radiation-sensitive acid-generating polymer (A1) further including a structural unit (IV) which includes a second organic acid anion and a second onium cation. The second onium cation is an onium cation including a halogen-free electron withdrawing group containing no halogen atom, and the second organic acid anion is a sulfonic acid anion including an iodine atom.