Resist Composition for Critical Dimension Uniformity
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Solution Overview
Problem
Existing resist compositions struggle to achieve uniformity in resist patterns, particularly in terms of critical dimension uniformity (CDU), which is crucial for precise manufacturing processes.
Innovation Solution
A resist composition comprising a specific compound represented by formula (I) and a resin with an acid-labile group, combined with an acid generator, is applied to a substrate, dried, exposed, heated, and developed to produce a resist pattern with improved CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the manufacturing process is simple, but the critical dimension uniformity (CDU) is poor
Solution Approach 1:
The patent uses a composite resin system combining polycycloolefin resin and polyester resin, where the polycycloolefin resin provides structural stability and the polyester resin contributes acid-labile groups for controlled decomposition. This composite approach achieves excellent CDU by balancing the mechanical properties and acid response characteristics of different resin components.
Solution Approach 2:
The patent introduces a specific compound with carboxylic acid groups at terminal positions and cyclic structures in the main chain. This compound provides localized functional groups that enhance acid generation efficiency and control the decomposition behavior in specific regions of the resist pattern, thereby improving critical dimension uniformity.
2Manufacturing precision
If existing resin systems are used, then the composition is easier to manufacture, but the resist pattern uniformity is insufficient
Solution Approach 1:
The patent carefully controls the ratio of polycycloolefin resin to polyester resin, and adjusts the amount of compound with formula (I) within specific ranges. By optimizing these parameters, the resist composition achieves excellent pattern uniformity while maintaining reasonable manufacturability through standard polymerization and blending processes.
3Manufacturing precision
If conventional acid generators are used, then the process is simpler, but the acid generation efficiency and CDU are lower
Solution Approach 1:
The patent employs a specific compound with carboxylic acid groups as an intermediary that facilitates efficient acid generation and transfer. This compound acts as a mediator between the acid source and the resist matrix, enhancing acid diffusion and decomposition uniformity, which directly improves critical dimension uniformity without requiring overly complex acid generator systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed resist composition effectively enhances CDU, ensuring the production of resist patterns with satisfactory uniformity and precision.
Implementation Method 1
a resist composition comprising a compound having the following structural formula (I), a resin including a structural unit having an acid-labile group, and an acid generator
Implementation Method 2
a step of heating the exposed composition layer
Data Source
AI summary
Disclosed is a compound represented by formula (I):in formula (I),R1 and R2 each independently represent a hydrogen atom or a methyl group,X1 and X2 each independently represent a group represented by any one of formula (X1−1) to formula (X1−8):A1 and A2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—, andR3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—.