Resist Composition Defect Reduction via Copolymer Contact Angle Blending
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Solution Overview
Problem
Conventional resist compositions fail to adequately reduce defects in resist patterns, particularly for fine patterns created using ArF excimer lasers or other advanced light sources, while maintaining favorable lithography characteristics such as resolution and depth of focus.
Innovation Solution
A method for producing a resist composition that involves mixing copolymers with the same structural units but different contact angles to achieve a contact angle of 30-40 degrees, which reduces defects and maintains lithography performance by adjusting the mixing proportions of copolymers to ensure the contact angle is within the desired range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional resist compositions are used, then lithography characteristics such as resolution and depth of focus are maintained, but the level of defects in resist patterns cannot be adequately reduced
Solution Approach 1:
The invention changes the contact angle parameter of the resin component by blending copolymers with different contact angles. Specifically, it blends a copolymer with a contact angle of 30-45 degrees (first copolymer) with a copolymer with a contact angle of 15-30 degrees (second copolymer) in proportions of 70:30 to 30:70, achieving an optimal contact angle range of 25-40 degrees that reduces defects while maintaining lithography characteristics
Solution Approach 2:
The invention uses a composite resin component formed by blending two different copolymers with the same structural units but different contact angles. This composite approach allows the resist composition to achieve properties that neither copolymer alone can provide, specifically reducing defects through optimized surface properties while maintaining the necessary lithography performance
2Reliability
If the contact angle is not optimized, then the resist composition may have simpler formulation, but defects in resist patterns increase
Solution Approach 1:
The invention optimizes the contact angle parameter by blending copolymers with specifically selected contact angle ranges (first copolymer: 30-45 degrees, second copolymer: 15-30 degrees) in controlled proportions (70:30 to 30:70), achieving a target contact angle of 25-40 degrees that minimizes defects
Solution Approach 2:
The invention applies different contact angle characteristics to different portions of the resin component by blending copolymers with distinct contact angle properties. The first copolymer (30-45 degrees) and second copolymer (15-30 degrees) contribute different local surface properties that, when combined, achieve the optimal overall contact angle for defect reduction
Data Source
AI summary
A method for producing a resist composition including a resin component (A) that exhibits changed alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, the method including the steps of: obtaining the component (A) by mixing a plurality of copolymers, which are composed of the same structural units but have mutually different measured values for the contact angle.