Resist Composition Defect Reduction via Composite Resin

The patent uses a composite resin system comprising multiple specific components: a resin with carboxyl groups (Component A), a polymer with carboxyl groups (Component B), and a polymer with hydroxyl groups (Component C). This composite formulation achieves the required mask error factor by combining materials with complementary properties, where each component contributes specific functional characteristics to the overall resist performance.

The patent precisely controls the carboxyl group content within specific ranges (0.1-10 mmol/g for Component A, 0.1-5.0 mmol/g for Component B) and the molecular weight of Component C (10,000-1,000,000). By adjusting these chemical parameters within defined boundaries, the formulation achieves optimal mask error factor while maintaining compositional complexity within acceptable limits.

The patent employs a multi-component composite resin system designed to minimize defects. Component A (resin with carboxyl groups) and Component B (polymer with carboxyl groups) work synergistically to provide controlled solubility and etch resistance, while Component C (polymer with hydroxyl groups) contributes to film uniformity and adhesion. This composite approach reduces pattern defects by balancing multiple functional requirements within a single formulation.

The patent assigns specific functional roles to different components at the molecular level: Component A and B provide acid-responsive solubility changes in specific regions, while Component C provides structural stability. This local functional differentiation within the composite material ensures uniform pattern formation and reduces defects by addressing different performance requirements at appropriate molecular scales.