Resist Composition for Focus Margin and Adhesion
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Solution Overview
Problem
Conventional resist compositions fail to consistently meet the focus margin requirements for producing resist patterns, particularly in terms of depth of focus (DOF).
Innovation Solution
A resist composition comprising a resin that is insoluble or poorly soluble in alkali aqueous solutions but becomes soluble upon acid action, combined with an acid generator and a specific compound, applied in a process involving application, drying, exposure, and heating, followed by development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition containing a resin, acid generator, and 2,6-diisopropylaniline quencher is used, then the resist pattern can be produced, but the focus margin (DOF) cannot be consistently satisfied
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific compound with formula (I) containing heterocyclic rings and fluorine atoms, and adjusting the resin composition to include carboxylic acid groups. These parameter changes in molecular structure and composition enable improved focus margin while maintaining pattern production reliability
Solution Approach 2:
The patent creates a composite resist composition by combining multiple components: a resin with carboxylic acid groups, an acid generator, a specific compound with formula (I) containing heterocyclic and fluorinated structures, and a solvent. This composite material approach allows the system to achieve both good adhesion and improved focus margin that individual components cannot provide alone
2Manufacturing precision
If the resist composition is optimized for resolution, then better pattern definition is achieved, but adhesion to substrate may be compromised
Solution Approach 1:
The patent applies local quality by giving different functional regions within the resist composition different properties: the resin with carboxylic acid groups provides adhesion at the substrate interface, while the compound with formula (I) containing heterocyclic rings and fluorine atoms enhances resolution in the exposed regions. This spatial differentiation of functions allows simultaneous optimization of both adhesion and resolution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved resolution and adhesiveness to substrates, enhancing the production of resist patterns with better focus margin and dry etching resistance.
Implementation Method 1
an acid generator represented by the formula (II)
Implementation Method 2
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 3
a compound represented by the formula (I), wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; ring W1 represents a C2 to C36 heterocyclic ring
Data Source
AI summary
A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I),wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.